Junquera Javier, Ghosez Philippe
Département de Physique, Université de Liège, Bâtiment B-5, B-4000 Sart-Tilman, Belgium.
Nature. 2003 Apr 3;422(6931):506-9. doi: 10.1038/nature01501.
The integration of ferroelectric oxide films into microelectronic devices, combined with the size reduction constraints imposed by the semiconductor industry, have revived interest in the old question concerning the possible existence of a critical thickness for ferroelectricity. Current experimental techniques have allowed the detection of ferroelectricity in perovskite films down to a thickness of 40 A (ten unit cells), ref. 3. Recent atomistic simulations have confirmed the possibility of retaining the ferroelectric ground state at ultralow thicknesses, and suggest the absence of a critical size. Here we report first-principles calculations on a realistic ferroelectric-electrode interface. We show that, contrary to current thought, BaTiO3 thin films between two metallic SrRuO3 electrodes in short circuit lose their ferroelectric properties below a critical thickness of about six unit cells (approximately 24 A). A depolarizing electrostatic field, caused by dipoles at the ferroelectric-metal interfaces, is the reason for the disappearance of the ferroelectric instability. Our results suggest the existence of a lower limit for the thickness of useful ferroelectric layers in electronic devices.
铁电氧化物薄膜与微电子器件的集成,再加上半导体行业对尺寸缩小的限制,重新引发了人们对关于铁电性是否可能存在临界厚度这一老问题的兴趣。目前的实验技术已经能够检测到厚度低至40埃(十个晶胞)的钙钛矿薄膜中的铁电性(参考文献3)。最近的原子模拟证实了在超低厚度下保持铁电基态的可能性,并表明不存在临界尺寸。在此,我们报告了对一个实际的铁电 - 电极界面的第一性原理计算。我们表明,与当前的观点相反,处于短路状态的两个金属SrRuO3电极之间的BaTiO3薄膜在低于约六个晶胞(约24埃)的临界厚度时会失去其铁电性能。由铁电 - 金属界面处的偶极子引起的去极化静电场是铁电不稳定性消失的原因。我们的结果表明电子器件中有用铁电层的厚度存在下限。