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全溶液处理的纯甲脒基钙钛矿发光二极管。

All-Solution-Processed Pure Formamidinium-Based Perovskite Light-Emitting Diodes.

机构信息

Institute of Polymer Optoelectronic Materials and Devices, South China University of Technology, State Key Laboratory of Luminescent Materials and Devices, Guangzhou, 510640, P. R. China.

出版信息

Adv Mater. 2018 Sep;30(39):e1804137. doi: 10.1002/adma.201804137. Epub 2018 Aug 12.

Abstract

All-solution-processed pure formamidinium-based perovskite light-emitting diodes (PeLEDs) with record performance are successfully realized. It is found that the FAPbBr device is hole dominant. To achieve charge carrier balance, on the anode side, PEDOT:PSS 8000 is employed as the hole injection layer, replacing PEDOT:PSS 4083 to suppress the hole current. On the cathode side, the solution-processed ZnO nanoparticle (NP) is used as the electron injection layer in regular PeLEDs to improve the electron current. With the smallest ZnO NPs (2.9 nm) as electron injection layer (EIL), the solution-processed PeLED exhibits a highest forward viewing power efficiency of 22.3 lm W , a peak current efficiency of 21.3 cd A , and an external quantum efficiency of 4.66%. The maximum brightness reaches a record 1.09 × 10 cd m . A record lifetime T of 436 s is achieved at the initial brightness of 10 000 cd m . Not only do PEDOT:PSS 8000 HIL and ZnO NPs EIL modulate the injected charge carriers to reach charge balance, but also they prevent the exciton quenching at the interface between the charge injection layer and the light emission layer. The subbandgap turn-on voltage is attributed to Auger-assisted energy up-conversion process.

摘要

成功实现了具有创纪录性能的全溶液处理纯甲脒基钙钛矿发光二极管(PeLED)。研究发现,FAPbBr 器件为空穴主导型。为了实现电荷载流子平衡,在阳极侧,使用 PEDOT:PSS 8000 作为空穴注入层,取代 PEDOT:PSS 4083 以抑制空穴电流。在阴极侧,在常规 PeLED 中使用溶液处理的 ZnO 纳米粒子(NP)作为电子注入层,以提高电子电流。使用最小的 ZnO NPs(2.9nm)作为电子注入层(EIL),溶液处理的 PeLED 表现出最高的正向观看功率效率为 22.3lmW,峰值电流效率为 21.3cdA,外量子效率为 4.66%。最大亮度达到创纪录的 1.09×10cdm。在初始亮度为 10000cdm 时,实现了创纪录的寿命 T 为 436s。PEDOT:PSS 8000 HIL 和 ZnO NPs EIL 不仅调节注入的电荷载流子以达到电荷平衡,而且还防止电荷注入层和发光层之间界面处的激子猝灭。亚带隙开启电压归因于俄歇辅助能量上转换过程。

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