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密度泛函理论揭示碳化硅缓冲层的本征结构和电子特性

Intrinsic structural and electronic properties of the Buffer Layer on Silicon Carbide unraveled by Density Functional Theory.

作者信息

Cavallucci Tommaso, Tozzini Valentina

机构信息

Istituto Nanoscienze, Cnr, Piazza San Silvestro 12, 56127, Pisa, Italy.

NEST- Scuola Normale Superiore Piazza San Silvestro 12, 56127, Pisa, Italy.

出版信息

Sci Rep. 2018 Aug 30;8(1):13097. doi: 10.1038/s41598-018-31490-7.

Abstract

The buffer carbon layer obtained in the first instance by evaporation of Si from the Si-rich surfaces of silicon carbide (SiC) is often studied only as the intermediate to the synthesis of SiC supported graphene. In this work, we explore its intrinsic potentialities, addressing its structural and electronic properties by means of Density Functional Theory. While the system of corrugation crests organized in a honeycomb super-lattice of nano-metric side returned by calculations is compatible with atomic microscopy observations, our work reveals some possible alternative symmetries, which might coexist in the same sample. The electronic structure analysis reveals the presence of an electronic gap of ~0.7 eV. In-gap states are present, localized over the crests, while near-gap states reveal very different structure and space localization, being either bonding states or outward pointing p orbitals and unsaturated Si dangling bonds. On one hand, the presence of these interface states was correlated with the n-doping of the monolayer graphene subsequently grown on the buffer. On the other hand, the correlation between their chemical character and their space localization is likely to produce a differential reactivity towards specific functional groups with a spatial regular modulation at the nano-scale, opening perspectives for a finely controlled chemical functionalization.

摘要

通过从碳化硅(SiC)富硅表面蒸发硅首次获得的缓冲碳层,通常仅作为合成SiC负载石墨烯的中间体进行研究。在这项工作中,我们探索了其内在潜力,借助密度泛函理论研究了其结构和电子性质。虽然计算得出的在纳米级边长的蜂窝超晶格中组织的波纹峰系统与原子显微镜观察结果相符,但我们的工作揭示了一些可能的替代对称性,它们可能在同一样品中共存。电子结构分析表明存在约0.7 eV的电子能隙。能隙态存在于波峰上,而近能隙态则显示出非常不同的结构和空间定位,它们要么是成键态,要么是向外指向的p轨道和未饱和的Si悬空键。一方面,这些界面态的存在与随后生长在缓冲层上的单层石墨烯的n型掺杂有关。另一方面,它们的化学性质与其空间定位之间的相关性可能会对特定官能团产生具有纳米级空间规则调制的差异反应性,为精细控制的化学功能化开辟了前景。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9eb1/6117312/273f18c0ac12/41598_2018_31490_Fig1_HTML.jpg

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