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MoS 单层与有机半导体并五苯的混合特性及其在反双极场效应晶体管中的应用。

Hybrid Characteristics of MoS Monolayer with Organic Semiconducting Tetracene and Application to Anti-Ambipolar Field Effect Transistor.

机构信息

Department of Physics , Korea University , Seoul 02842 , Republic of Korea.

Center for Integrated Nanostructure Physics (CINAP) , Institute of Basic Science (IBS) , Suwon 16419 , Republic of Korea.

出版信息

ACS Appl Mater Interfaces. 2018 Sep 26;10(38):32556-32566. doi: 10.1021/acsami.8b10525. Epub 2018 Sep 17.

Abstract

An n-type MoS monolayer grown by chemical vapor deposition method was partially hybridized with an organic semiconducting p-type tetracene thin film. The photoluminescence (PL) intensity in the hybrid region of the MoS/tetracene is clearly lower than that of pristine tetracene because of the charge-transfer effect, which was confirmed by the decrease in exciton lifetimes. Decrease in the temperature led to blue-shift in the PL peak position of MoS layers and, consequently, the PL intensities of both tetracene and MoS considerably increased owing to the decrease in phonon interaction. The PL spectra of bound excitons in the hybrid region were clearly observed at low temperatures, indicating the formation of trap states. The lateral-type n-p heterojunction field-effect transistors (FETs) using the MoS/tetracene hybrid as an active layer showed gate-tunable rectification I- V and anti-ambipolar field-effect characteristics with hysteresis effect. The charge transport characteristics across the n-p heterojunction of the hybrid region of the FET can be explained in terms of the Shockley-Read-Hall trap-intermediated tunneling and Langevin recombination mechanisms. To improve the performance of MoS/tetracene-based FET, a dielectric hexagonal boron nitride (h-BN) thin layer was inserted between the SiO surface and the active MoS layer. We observed the decrease in the hysteresis effect and threshold voltage of the h-BN/MoS/tetracene-based FETs due to the decrease in the number of traps at the interface. The performance of h-BN/MoS/tetracene FET device was also enhanced after the annealing process.

摘要

采用化学气相沉积法生长的 n 型 MoS 单层部分与有机半导体 p 型并四苯薄膜杂交。由于电荷转移效应,MoS/并四苯的杂交区域中的光致发光(PL)强度明显低于原始并四苯,这一点通过激子寿命的降低得到了证实。温度的降低导致 MoS 层的 PL 峰位置蓝移,因此由于声子相互作用的减少,MoS 和并四苯的 PL 强度都大大增加。在低温下可以清楚地观察到杂化区域中束缚激子的 PL 光谱,表明形成了陷阱态。使用 MoS/并四苯杂化作为有源层的横向 n-p 异质结场效应晶体管(FET)表现出栅可调整流 I-V 和反双极场效应特性,具有滞后效应。可以根据肖克利-里德-霍尔(Shockley-Read-Hall)陷阱中介隧穿和兰格文(Langevin)复合机制来解释 FET 杂化区域中 n-p 异质结的电荷输运特性。为了提高基于 MoS/并四苯的 FET 的性能,在 SiO 表面和有源 MoS 层之间插入了介电六方氮化硼(h-BN)薄膜。我们观察到由于界面处陷阱数量的减少,h-BN/MoS/并四苯基 FET 的滞后效应和阈值电压降低。退火后,h-BN/MoS/并四苯 FET 器件的性能也得到了提高。

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