Cho Sang-Hoo, Jang Hanbyeol, Im Heungsoon, Lee Donghyeon, Lee Je-Ho, Watanabe Kenji, Taniguchi Takashi, Seong Maeng-Je, Lee Byoung Hun, Lee Kayoung
School of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju, 61005, Republic of Korea.
Department of Physics, Chung-Ang University, Seoul, 06974, Republic of Korea.
Sci Rep. 2021 Apr 12;11(1):7843. doi: 10.1038/s41598-021-87442-1.
Van der Waals (vdW) heterostructures, consisting of a variety of low-dimensional materials, have great potential use in the design of a wide range of functional devices thanks to their atomically thin body and strong electrostatic tunability. Here, we demonstrate multi-functional indium selenide (InSe)/black phosphorous (BP) heterostructures encapsulated by hexagonal boron nitride. At a positive drain bias (V), applied on the BP while the InSe is grounded, our heterostructures show an intermediate gate voltage (V) regime where the current hardly changes, working as a ternary transistor. By contrast, at a negative V, the device shows strong negative differential transconductance characteristics; the peak current increases up to ~5 μA and the peak-to-valley current ratio reaches 1600 at V = -2 V. Four-terminal measurements were performed on each layer, allowing us to separate the contributions of contact resistances and channel resistance. Moreover, multiple devices with different device structures and contacts were investigated, providing insight into the operation principle and performance optimization. We systematically investigated the influence of contact resistances, heterojunction resistance, channel resistance, and the thickness of BP on the detailed operational characteristics at different V and V regimes.
由多种低维材料组成的范德华(vdW)异质结构,由于其原子级薄的结构和强大的静电可调性,在各种功能器件的设计中具有巨大的潜在用途。在此,我们展示了由六方氮化硼封装的多功能硒化铟(InSe)/黑磷(BP)异质结构。当在InSe接地的情况下对BP施加正漏极偏压(V)时,我们的异质结构显示出一个中间栅极电压(V)区域,其中电流几乎不变,起到三端晶体管的作用。相比之下,在负V时,该器件表现出强烈的负微分跨导特性;在V = -2 V时,峰值电流增加到约5 μA,峰谷电流比达到1600。对每一层进行了四端测量,使我们能够区分接触电阻和沟道电阻的贡献。此外,还研究了具有不同器件结构和接触的多个器件,从而深入了解其工作原理和性能优化。我们系统地研究了接触电阻、异质结电阻、沟道电阻以及BP厚度对不同V和V区域详细工作特性的影响。