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基于氧化铟栅的 1 伏硅基光子晶体纳米腔调制器。

One-volt silicon photonic crystal nanocavity modulator with indium oxide gate.

出版信息

Opt Lett. 2018 Sep 15;43(18):4429-4432. doi: 10.1364/OL.43.004429.

Abstract

The ever-increasing global network traffic requires a high level of seamless integration between optical interconnect systems and complementary metal-oxide-semiconductor (CMOS) circuits. Therefore, it brings stringent requirements for future electro-optic (E-O) modulators, which should be ultracompact, energy efficient, high bandwidth, and in the meanwhile, able to be directly driven by the state-of-the-art CMOS circuits. In this Letter, we report a low-voltage silicon photonic crystal nanocavity modulator using an optimized metal-oxide-semiconductor (MOS) capacitor consisting of an InO/HfO/p-Si stacked nanostructure. The strong light-matter interaction from the accumulated free carriers with the nanocavity resonant mode results in holistic improvement in device performance, including a high tuning efficiency of 250 pm/V and an average modulation strength of 4 dB/V with a moderate Q factor of ∼3700 and insertion loss of ∼6  dB using an ultrashort electrode length of only 350 nm. With 1 V driving voltage over a capacitive loading of only 13 fF, the silicon photonic nanocavity modulator can achieve more than 3 dB extinction ratio with energy consumption of only 3 fJ/bit. Such a low-voltage, low-capacitance silicon nanocavity modulator provides the feasibility to be directly driven by a CMOS logic gate for single-chip integration.

摘要

不断增长的全球网络流量要求光互连系统与互补金属氧化物半导体 (CMOS) 电路之间实现高度无缝集成。因此,这对未来的电光 (E-O) 调制器提出了严格的要求,调制器应超紧凑、高能效、高带宽,并且能够直接由最先进的 CMOS 电路驱动。在本信中,我们报告了一种使用优化的金属-氧化物-半导体 (MOS) 电容器的低电压硅光子晶体纳米腔调制器,该电容器由 InO/HfO/p-Si 堆叠纳米结构组成。来自纳米腔共振模式中积累的自由载流子的强光物质相互作用导致器件性能的整体提高,包括 250 pm/V 的高调谐效率和 4 dB/V 的平均调制强度,使用仅 350nm 的超短电极长度,Q 因子约为 3700,插入损耗约为 6 dB。在仅 13 fF 的电容负载下,使用 1V 的驱动电压,可以实现超过 3dB 的消光比,功耗仅为 3fJ/bit。这种低电压、低电容的硅纳米腔调制器为通过 CMOS 逻辑门进行单芯片集成提供了直接驱动的可行性。

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