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理论预测的高导热立方氮化硅和氮化锗:用于高功率电子器件的有前景的衬底材料。

Theoretical predicted high-thermal-conductivity cubic SiN and GeN: promising substrate materials for high-power electronic devices.

作者信息

Xiang Huimin, Feng Zhihai, Li Zhongping, Zhou Yanchun

机构信息

Science and Technology on Advanced Functional Composite Laboratory, Aerospace Research Institute of Materials and Processing Technology, No. 1 South Dahongmen Road, Beijing, 100076, China.

出版信息

Sci Rep. 2018 Sep 26;8(1):14374. doi: 10.1038/s41598-018-32739-x.

Abstract

Ceramic substrates play key roles in power electronic device technology through dissipating heat, wherein both high thermal conductivity and mechanical strength are required. The increased power of new devices has led to the replacement of AlO by high thermal conducting AlN and further β-SiN based substrates. However, the low mechanical strength and/or anisotropic mechanical/thermal properties are still the bottlenecks for the practical applications of these materials in high power electronic devices. Herein, using a combination of density functional theory and modified Debye-Callaway model, two new promising substrate materials γ-SiN and γ-GeN are predicted. Our results demonstrate for the first time that both compounds exhibit higher room temperature thermal conductivity but less anisotropy in expansion and heat conduction compared to β-SiN. The mechanism underpins the high RT κ is identified as relatively small anharmonicity, high phonon velocity and frequency. The suitability of these two nitrides as substrate materials was also discussed.

摘要

陶瓷基板通过散热在电力电子器件技术中发挥着关键作用,其中需要高导热性和机械强度。新器件功率的增加导致高导热性的AlN取代了AlO,进而又出现了基于β - SiN的基板。然而,低机械强度和/或各向异性的机械/热性能仍然是这些材料在高功率电子器件实际应用中的瓶颈。在此,结合密度泛函理论和修正的德拜 - 卡拉韦模型,预测了两种有前景的新型基板材料γ - SiN和γ - GeN。我们的结果首次表明,与β - SiN相比,这两种化合物都具有更高的室温热导率,但在膨胀和热传导方面的各向异性较小。支撑高室温热导率的机制被确定为相对较小的非简谐性、高声子速度和频率。还讨论了这两种氮化物作为基板材料的适用性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/33b4/6158267/5e0698d6096d/41598_2018_32739_Fig1_HTML.jpg

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