在聚对苯二甲酸乙二酯基底上制备折射率匹配的MTO/Ag/MTO多层膜
Development of Refractive-Index-Matched MTO/Ag/MTO Multilayer Film on Poly(ethylene terephthalate) Substrate.
作者信息
Yoon Sangmoo, Jang Guneik
机构信息
Department of Materials Engineering, Chungbuk National University, Cheongju 28644, Korea.
出版信息
J Nanosci Nanotechnol. 2019 Mar 1;19(3):1485-1489. doi: 10.1166/jnn.2019.16262.
In this study, we fabricate a transparent conductive multilayer film consisting of an Ag layer sandwiched between manganese-doped SnO₂ layers (MTO/Ag/MTO) with a refractive index-matching layer (IML) on a poly(ethylene terephthalate) (PET) substrate. SiO₂ ( = 1.5 @ 550 nm) and MTO ( = 2.7 @ 550 nm) are selected as the low and high-refractive-index materials. In order to evaluate the reflectance (Δ) and color difference (Δ*) properties relate to the electrode pattern visibility of transparent conducting oxide (TCO) films, we systematically investigate the influence of the SiO₂/MTO IMLs on the MTO (40 nm)/Ag (13 nm)/MTO (40 nm) TCO film. We find that the optical transmittance of all fabricated films are above 85% at a wavelength of 550 nm. The thickness of the IMLs exhibiting optimum characteristics is SiO₂ (70, 80, 90 nm)/MTO (10 nm). In addition, the Δ and Δ* of the optimized films are 2.5, 2.1, and 1.6%, and 1.4, 1.1, and 0.7, respectively.
在本研究中，我们在聚对苯二甲酸乙二酯（PET）基板上制备了一种透明导电多层膜，该膜由夹在锰掺杂的SnO₂层（MTO）之间的Ag层（MTO/Ag/MTO）组成，并带有一个折射率匹配层（IML）。选择SiO₂（550 nm处折射率为1.5）和MTO（550 nm处折射率为2.7）作为低折射率和高折射率材料。为了评估与透明导电氧化物（TCO）膜的电极图案可见性相关的反射率（Δ）和色差（Δ*）特性，我们系统地研究了SiO₂/MTO IML对MTO（40 nm）/Ag（13 nm）/MTO（40 nm）TCO膜的影响。我们发现，所有制备薄膜在550 nm波长处的光学透过率均高于85%。表现出最佳特性的IML厚度为SiO₂（70、80、90 nm）/MTO（10 nm）。此外，优化薄膜的Δ和Δ*分别为2.5%、2.1%和1.6%，以及1.4、1.1和0.7。
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