Masih Das Paul, Thiruraman Jothi Priyanka, Chou Yung-Chien, Danda Gopinath, Drndić Marija
Nano Lett. 2019 Jan 9;19(1):392-399. doi: 10.1021/acs.nanolett.8b04155. Epub 2018 Dec 17.
Two-dimensional nanoporous membranes have received attention as catalysts for energy generation and membranes for liquid and gas purification but controlling their porosity and facilitating large-scale production is challenging. We show the growth and fabrication of centimeter-scale molybdenum disulfide (MoS) membranes with tunable porous areas up to ∼ 10% of the membrane and average nanopore diameters as large as ∼ 30 nm, controlled by the etch time. We also measure ionic conductance between 0.1 and 16 μS per μm through variably etched nanoporous membranes. Ensuring the mechanical robustness and large-area of the membrane, bilayer and few-layer regions form a strong supporting matrix around monolayer regions, observed by aberration-corrected scanning transmission electron microscopy. During etching, nanopores form in thin, primarily monolayer areas whereas thicker multilayer regions remain essentially intact. Atomic-resolution imaging reveals that after exposure to the etchant, the number of V vacancies increases and nanopores form along grain boundaries in monolayers, suggesting that etching starts at intrinsic defect sites. This work provides an avenue for the scalable production of nanoporous atomically thin membranes.
二维纳米多孔膜作为能源生成催化剂以及液体和气体净化膜受到了关注,但控制其孔隙率并实现大规模生产具有挑战性。我们展示了厘米级二硫化钼(MoS)膜的生长和制备,其可调谐多孔区域占膜的比例高达约10%,平均纳米孔径大至约30 nm,可通过蚀刻时间进行控制。我们还测量了通过可变蚀刻的纳米多孔膜的离子电导,范围为每微米0.1至16 μS。通过像差校正扫描透射电子显微镜观察到,双层和少层区域在单层区域周围形成了坚固的支撑基质,从而确保了膜的机械稳健性和大面积。在蚀刻过程中,纳米孔在主要为单层的薄区域形成,而较厚的多层区域基本保持完整。原子分辨率成像显示,暴露于蚀刻剂后,V空位数量增加,纳米孔沿单层中的晶界形成,表明蚀刻始于固有缺陷位点。这项工作为可扩展生产纳米多孔原子级薄膜提供了一条途径。