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通过片上激光烧蚀实现等离子体隧道间隙的纳米级光发射电流。

Toward Plasmonic Tunnel Gaps for Nanoscale Photoemission Currents by On-Chip Laser Ablation.

机构信息

Walter Schottky Institute and Physics Department , Technical University of Munich , Am Coulombwall 4a , Garching 85748 , Germany.

Nanosystems Initiative Munich (NIM) , Schellingstr. 4 , Munich 80799 , Germany.

出版信息

Nano Lett. 2019 Feb 13;19(2):1172-1178. doi: 10.1021/acs.nanolett.8b04612. Epub 2019 Jan 11.

Abstract

We demonstrate that prestructured metal nanogaps can be shaped on-chip to below 10 nm by femtosecond laser ablation. We explore the plasmonic properties and the nonlinear photocurrent characteristics of the formed tunnel junctions. The photocurrent can be tuned from multiphoton absorption toward the laser-induced strong-field tunneling regime in the nanogaps. We demonstrate that a unipolar ballistic electron current is achieved by designing the plasmonic junctions to be asymmetric, which allows ultrafast electronics on the nanometer scale.

摘要

我们证明了飞秒激光烧蚀可以在芯片上把金属纳米间隙预结构化到 10nm 以下。我们探索了所形成的隧道结的等离子体性质和非线性光电流特性。光电流可以从多光子吸收调谐到纳米间隙中的激光诱导强场隧穿模式。我们通过设计不对称的等离子体结来实现单极弹道电子电流,从而证明了在纳米尺度上实现超快电子学的可能性。

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