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一个 WSe 垂直场发射晶体管。

A WSe vertical field emission transistor.

机构信息

Physics Department "E. R. Caianiello", University of Salerno, via Giovanni Paolo II n. 132, Fisciano 84084, Italy.

出版信息

Nanoscale. 2019 Jan 23;11(4):1538-1548. doi: 10.1039/c8nr09068h.

Abstract

We report the first observation of a gate-controlled field emission current from a tungsten diselenide (WSe2) monolayer, synthesized by chemical-vapour deposition on a SiO2/Si substrate. Ni contacted WSe2 monolayer back-gated transistors, under high vacuum, exhibit n-type conduction and drain-bias dependent transfer characteristics, which are attributed to oxygen/water desorption and drain induced Schottky barrier lowering, respectively. The gate-tuned n-type conduction enables field emission, i.e. the extraction of electrons by quantum tunnelling, even from the flat part of the WSe2 monolayers. Electron emission occurs under an electric field ∼100 V μm-1 and exhibits good time stability. Remarkably, the field emission current can be modulated by the back-gate voltage. The first field-emission vertical transistor based on the WSe2 monolayer is thus demonstrated and can pave the way to further optimize new WSe2 based devices for use in vacuum electronics.

摘要

我们首次观察到了由化学气相沉积在 SiO2/Si 衬底上合成的二硒化钨 (WSe2) 单层的栅控场发射电流。在高真空下,Ni 接触的 WSe2 单层背栅晶体管表现出 n 型传导和漏极偏压相关的转移特性,分别归因于氧/水的解吸和漏极诱导肖特基势垒降低。栅极调谐的 n 型传导使得电子通过量子隧穿被提取出来,即使是从 WSe2 单层的平坦部分。电子发射发生在约 100 V μm-1 的电场下,并且表现出良好的时间稳定性。值得注意的是,场发射电流可以通过背栅电压进行调制。因此,首次展示了基于 WSe2 单层的场发射垂直晶体管,这为进一步优化基于 WSe2 的新型器件在真空电子学中的应用铺平了道路。

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