Advanced Materials and Energy MatyEr Research Group, Biomaterials and Electromedicine Laboratory, Instituto Tecnológico Metropolitano, Calle 54A No. 30-01, Medellín 050013, Colombia.
FEMTO-ST Institute, CNRS UMR6174, University of Bourgogne Franche-Comté, 25030 Besançon, France.
Sensors (Basel). 2019 Feb 21;19(4):892. doi: 10.3390/s19040892.
Thin films are a type of coating that have a very wide spectrum of applications. They may be used as single layers or composed in multilayer stacks, which significantly extend their applications. One of the most commonly used material for thin films is silicon dioxide, SiO₂. Although there are other tools that can be used to measure the thickness of SiO₂ films, these tools are very complex and sophisticated. In this article, we propose the use of an exponential two-layer light-material interaction model, throughout its diffuse reflectance spectra, as an alternative for the measurement of the thickness of evaporated SiO₂ on Si wafers. The proposed model is evaluated experimentally by means of a 980-nm-thick SiO₂ layer evaporated on a Si wafer. The results show that the proposed model has a strong correlation with the thickness measurements obtained using commercial equipment.
薄膜是一种具有广泛应用的涂层。它们可以作为单层使用，也可以组成多层堆叠，从而显著扩展其应用范围。最常用于薄膜的材料之一是二氧化硅，SiO₂。虽然还有其他工具可用于测量 SiO₂ 薄膜的厚度，但这些工具非常复杂和精密。在本文中，我们提出了使用指数双层光材料相互作用模型来测量 Si 晶片上蒸发的 SiO₂ 的厚度，该模型通过在 Si 晶片上蒸发 980nm 厚的 SiO₂ 层进行了实验评估。结果表明，该模型与使用商业设备获得的厚度测量值具有很强的相关性。
