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硅纳米线中 2H 六方硅的直接证据。

Direct evidence of 2H hexagonal Si in Si nanowires.

机构信息

State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083, China.

出版信息

Nanoscale. 2019 Mar 14;11(11):4846-4853. doi: 10.1039/c8nr10370d.

Abstract

Hexagonal Si (2H polytype) has attracted great interest because of its unique physical properties and wide range of potential applications. For example, it might be used in heterojunctions based on hexagonal and cubic Si. Although hexagonal Si has been reported in Si nanowires, its existence is doubted because structural defects of diamond cubic Si can produce structural signals similar to those attributed to hexagonal Si. Here, through the use of atomic resolution high-angle annular dark-field scanning transmission electron microscopy imaging, we unambiguously report the coherent intergrowth of diamond cubic (3C polytype) and 2H hexagonal Si in Si nanowires grown by chemical vapor deposition. A model describing the intergrowth of 3C and 2H Si is proposed and the reasons for the generation of 2H Si are discussed in detail.

摘要

六方硅(2H 多型)因其独特的物理性质和广泛的潜在应用而引起了极大的关注。例如,它可能用于基于六方和立方硅的异质结。尽管在硅纳米线中已经报道了六方硅的存在,但由于立方硅的结构缺陷会产生与归因于六方硅的结构信号相似的结构信号,因此其存在受到质疑。在这里,通过使用原子分辨率高角度环形暗场扫描透射电子显微镜成像,我们明确报告了在化学气相沉积生长的硅纳米线中立方(3C 多型)和 2H 六方硅的相干共生长。提出了一个描述 3C 和 2H 硅共生长的模型,并详细讨论了 2H 硅生成的原因。

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