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六方 Ge 和 SiGe 合金的直接带隙发射。

Direct-bandgap emission from hexagonal Ge and SiGe alloys.

机构信息

Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands.

Institut für Festkörpertheorie und -optik, Friedrich-Schiller-Universität Jena, Jena, Germany.

出版信息

Nature. 2020 Apr;580(7802):205-209. doi: 10.1038/s41586-020-2150-y. Epub 2020 Apr 8.

Abstract

Silicon crystallized in the usual cubic (diamond) lattice structure has dominated the electronics industry for more than half a century. However, cubic silicon (Si), germanium (Ge) and SiGe alloys are all indirect-bandgap semiconductors that cannot emit light efficiently. The goal of achieving efficient light emission from group-IV materials in silicon technology has been elusive for decades. Here we demonstrate efficient light emission from direct-bandgap hexagonal Ge and SiGe alloys. We measure a sub-nanosecond, temperature-insensitive radiative recombination lifetime and observe an emission yield similar to that of direct-bandgap group-III-V semiconductors. Moreover, we demonstrate that, by controlling the composition of the hexagonal SiGe alloy, the emission wavelength can be continuously tuned over a broad range, while preserving the direct bandgap. Our experimental findings are in excellent quantitative agreement with ab initio theory. Hexagonal SiGe embodies an ideal material system in which to combine electronic and optoelectronic functionalities on a single chip, opening the way towards integrated device concepts and information-processing technologies.

摘要

在通常的立方(金刚石)晶格结构中结晶的硅已经主导了电子行业半个多世纪。然而,立方硅(Si)、锗(Ge)和 SiGe 合金都是间接带隙半导体,不能有效地发光。几十年来,人们一直致力于在硅技术中实现高效的 IV 族材料发光,但这一目标一直难以实现。在这里,我们展示了来自直接带隙六方 Ge 和 SiGe 合金的高效发光。我们测量了亚纳秒级、温度不敏感的辐射复合寿命,并观察到与直接带隙 III-V 族半导体相似的发射产率。此外,我们证明,通过控制六方 SiGe 合金的组成,可以在保持直接带隙的同时,连续调谐宽波段的发射波长。我们的实验结果与从头算理论非常吻合。六方 SiGe 体现了一种理想的材料体系,可以在单个芯片上结合电子和光电功能,为集成器件概念和信息处理技术开辟了道路。

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