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Excision repair of DNA in the presence of aphidicolin.

作者信息

Th'ng J P, Walker I G

出版信息

Mutat Res. 1986 May;165(3):139-50. doi: 10.1016/0167-8817(86)90048-9.

DOI:10.1016/0167-8817(86)90048-9
PMID:3084964
Abstract

During excision repair of UV light or dimethyl sulphate (DMS)-induced damage to DNA the patch size for actively replicating KB or T98G cells is around 20 nucleotides. When confluent T98G cells or 'quiescent' KB cells are used the patch size is around 10 nucleotides. This value can be increased to around 20 nucleotides in T98G cells if a large excess of BrdUrd is included in the repair incubation medium. With 'quiescent' KB cells the patch size is not increased by excess BrdUrd. For all of these experimental conditions, when excision repair of UV or DMS damage takes place in the presence of aphidicolin, the patch size is found to be several times that found in its absence. Given the inhibitory specificity of aphidicolin for DNA polymerase alpha these results provide additional evidence that DNA polymerase alpha plays a role in the excision repair of DNA damaged by UV light or DMS. It is postulated that aphidicolin interrupts the processivity of the DNA polymerase alpha holoenzyme and allows an exonuclease to enlarge the repair site.

摘要

相似文献

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引用本文的文献

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2
Fine-mapping of DNA damage and repair in specific genomic segments.特定基因组片段中DNA损伤与修复的精细定位
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Human nucleotide excision nuclease removes thymine dimers from DNA by incising the 22nd phosphodiester bond 5' and the 6th phosphodiester bond 3' to the photodimer.人类核苷酸切除核酸酶通过切割光二聚体5'端的第22个磷酸二酯键和3'端的第6个磷酸二酯键从DNA中去除胸腺嘧啶二聚体。
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