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非晶态红磷薄膜的高电子迁移率。

High Electron Mobility of Amorphous Red Phosphorus Thin Films.

作者信息

Amaral Pedro E M, Nieman Glen P, Schwenk Gregory R, Jing Hao, Zhang Raymond, Cerkez Elizabeth B, Strongin Daniel, Ji Hai-Feng

机构信息

Department of Chemistry, Drexel University, Philadelphia, PA, 19104, USA.

Department of Chemistry, Temple University, Philadelphia, PA, 19122, USA.

出版信息

Angew Chem Int Ed Engl. 2019 May 13;58(20):6766-6771. doi: 10.1002/anie.201902534. Epub 2019 Apr 17.

Abstract

Black phosphorus (BP) has been gathering great attention for its electronic and optoelectronic applications due to its high electron mobility and high I current switching ratio. The limitations of this material include its low synthetic yield and high cost. One alternative to BP is another type of phosphorus allotrope, red phosphorus (RP), which is much more affordable and easier to process. Although RP has been widely used in industry for hundreds of years and considered as an insulating material, in this study, we demonstrate through field-effect transistors (FET) measurements that amorphous red phosphorus (a-RP) films are semiconductive with a high mobility of 387 cm  V  s and a current switching ratio of ≈10 , which is comparable to the electronic characteristics previously reported for BP. The films were produced via a thermal evaporation method or a facile drop-casting approach onto Si/SiO substrates. We also report a study of the oxidation process of the films over time and a method to stabilize the films via doping a-RP with metal oxides. The doped films retain stability for one thousand I-V cycles, with no signs of degradation.

摘要

黑磷(BP)因其高电子迁移率和高电流开关比,在电子和光电子应用方面备受关注。这种材料的局限性包括合成产率低和成本高。BP的一种替代材料是另一种磷的同素异形体——红磷(RP),它价格更为低廉且易于加工。尽管RP已在工业中广泛使用了数百年且被视为绝缘材料,但在本研究中,我们通过场效应晶体管(FET)测量表明,非晶态红磷(a-RP)薄膜具有半导体特性,迁移率高达387 cm² V⁻¹ s⁻¹,电流开关比约为10,这与先前报道的BP的电子特性相当。这些薄膜是通过热蒸发法或简便的滴铸法制备在Si/SiO₂衬底上的。我们还报告了对薄膜随时间氧化过程的研究以及一种通过用金属氧化物掺杂a-RP来稳定薄膜的方法。掺杂后的薄膜在一千次I-V循环中保持稳定,没有降解迹象。

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