Jo Kyoung-Il, Kim Tae-Ho, Choi Ki-In, Lee Hoyeon, Choi Jae-Hak, Bang Joona, Kim Tae-Hwan, Yuan Guangcui, Satija Sushil K, Koo Jaseung
Neutron Science Division , Korea Atomic Energy Research Institute (KAERI) , 989-111 Daeduk-daero , Yuseong-gu, Daejeon 34057 , Korea.
Department of Chemical and Biological Engineering , Korea University , 145 Anam-ro , Seongbuk-gu, Seoul 02841 , Korea.
Langmuir. 2019 Apr 23;35(16):5549-5556. doi: 10.1021/acs.langmuir.9b00141. Epub 2019 Apr 15.
We investigated the effect of the morphological structure of a graphene oxide (GO) monolayer on the dewetting dynamics of the upper polymer thin films. The Langmuir-Schaefer (LS) technique was used to prepare a wrinkled GO ( wrGO) structure with a root mean square (rms) roughness of 22.7 Å. The dewetting behavior of poly(methyl methacrylate) (PMMA) thin films on the wrGO monolayers was perfectly prevented, whereas the PMMA thin films on a flat GO monolayer were dewetted at 203 °C. This wrinkle effect of the GO can be also obtained when the GOs monolayers are intercalated to the PMMA/polystyrene (PS) interface. In this multilayer, the flat GO monolayer at the interface between the PS and PMMA layers was spontaneously roughened with rms roughness of 46.9 Å after annealing and also prohibited the dewetting behavior. From the results, we found that to improve the compatibility of polymer blends by adding the two-dimensional nanosheets, it is important to control the morphological structure of the sheets at the interface, along with manipulation of the GO-polymer interactions.
我们研究了氧化石墨烯（GO）单层的形态结构对上层聚合物薄膜去湿动力学的影响。采用朗缪尔-谢弗（LS）技术制备了均方根（rms）粗糙度为22.7 Å的皱纹状GO（wrGO）结构。聚甲基丙烯酸甲酯（PMMA）薄膜在wrGO单层上的去湿行为得到了完美抑制，而在平坦GO单层上的PMMA薄膜在203 °C时发生去湿。当GO单层插入到PMMA/聚苯乙烯（PS）界面时，也能获得GO的这种皱纹效应。在这种多层结构中，PS和PMMA层之间界面处的平坦GO单层在退火后自发地变得粗糙，均方根粗糙度为46.9 Å，并且也抑制了去湿行为。从结果中我们发现，通过添加二维纳米片来改善聚合物共混物的相容性时，控制界面处片层的形态结构以及调控GO与聚合物之间的相互作用很重要。
