Shanghai Key Laboratory of New Drug Design, School of Pharmacy, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, China.
Shanghai Key Laboratory of New Drug Design, School of Pharmacy, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, China.
Toxicol In Vitro. 2019 Sep;59:204-214. doi: 10.1016/j.tiv.2019.01.004. Epub 2019 Apr 24.
Skin sensitisation, one of the most frequent forms of human immune toxicity, is authenticated to be a significant endpoint in the field of drug discovery and cosmetics. Due to the drawbacks of traditional animal testing methods, in silico methods have advanced to study skin sensitisation. In this study, mechanism-based binary and ternary classification models were constructed with a comprehensive data set. 1007 compounds were collected to develop five series of local and global models based on mechanisms. In each series, compounds were classified into five groups according to EC3 values, and applied as training sets, test sets and external validation sets. For each of the five series, 81 binary classification models and 81 ternary classification models were acquired via 9 molecular fingerprints and 9 machine learning methods using a novel KNIME workflow. Meanwhile, the applicability domains for the best 10 models were figured out to certify the rationality of prediction effect. In addition, 8 toxic substructures probably causing skin sensitisation were identified to speculate whether a compound is a skin sensitiser. The mechanism-based prediction models and the toxic substructures can be applied to predict the skin sensitising potential and potency of compounds.
皮肤致敏是人类最常见的免疫毒性形式之一,已被确认为药物发现和化妆品领域的一个重要终点。由于传统动物测试方法的缺点,基于计算的方法已经发展到可以研究皮肤致敏。在这项研究中,构建了基于机制的二元和三元分类模型的综合数据集。收集了 1007 种化合物,基于机制开发了五个系列的局部和全局模型。在每个系列中,根据 EC3 值将化合物分为五组,并将其用作训练集、测试集和外部验证集。对于五个系列中的每一个,使用一种新颖的 KNIME 工作流程,通过 9 种分子指纹和 9 种机器学习方法,获得了 81 个二元分类模型和 81 个三元分类模型。同时,确定了最佳 10 个模型的适用性域,以证明预测效果的合理性。此外,还确定了 8 个可能导致皮肤致敏的毒性亚结构,以推测化合物是否为皮肤致敏剂。基于机制的预测模型和毒性亚结构可用于预测化合物的皮肤致敏潜力和强度。