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计算加速碘化亚铜中预期掺杂剂的发现。

Computational acceleration of prospective dopant discovery in cuprous iodide.

机构信息

Department of Physics, Universität Basel, Klingelbergstr. 82, 4056 Basel, Switzerland.

Institut für Festkörpertheorie und -optik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany.

出版信息

Phys Chem Chem Phys. 2019 Sep 21;21(35):18839-18849. doi: 10.1039/c9cp02711d. Epub 2019 Jul 29.

DOI:10.1039/c9cp02711d
PMID:31353386
Abstract

The zinc blende (γ) phase of copper iodide holds the record hole conductivity for intrinsic transparent p-type semiconductors. In this work, we employ a high-throughput approach to systematically explore strategies for enhancing γ-CuI further by impurity incorporation. Our objectives are not only to find a practical approach to increase the hole conductivity in CuI thin films, but also to explore the possibility for ambivalent doping. In total 64 chemical elements were investigated as possible substitutionals on either the copper or the iodine site. All chalcogen elements were found to display acceptor character when substituting iodine, with sulfur and selenium significantly enhancing carrier concentrations produced by the native V defects under conditions most favorable for impurity incorporation. Furthermore, eight impurities suitable for n-type doping were discovered. Unfortunately, our work also reveals that donor doping is hindered by compensating native defects, making ambipolar doping unlikely. Finally, we investigated how the presence of impurities influences the optical properties. In the majority of the interesting cases, we found no deep states in the band-gap, showing that CuI remains transparent upon doping.

摘要

碘化亚铜的闪锌矿(γ)相拥有本征透明 p 型半导体中最高的空穴电导率记录。在这项工作中,我们采用高通量方法系统地研究了通过杂质掺入进一步增强 γ-CuI 的策略。我们的目标不仅是找到一种提高 CuI 薄膜中空穴电导率的实用方法,还要探索双掺杂的可能性。总共研究了 64 种化学元素作为铜或碘位的可能替代物。所有的硫属元素在取代碘时都表现出受主特性,而硫和硒在最有利于杂质掺入的条件下,显著提高了本征 V 缺陷产生的载流子浓度。此外,还发现了 8 种适合 n 型掺杂的杂质。不幸的是,我们的工作还表明施主掺杂受到本征缺陷的补偿阻碍,使得双极性掺杂不太可能。最后,我们研究了杂质的存在如何影响光学性质。在大多数有趣的情况下,我们在带隙中没有发现深能级,这表明 CuI 在掺杂后仍然是透明的。

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引用本文的文献

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Dopant Control of Solution-Processed CuI:S for Highly Conductive p-Type Transparent Electrode.用于高导电p型透明电极的溶液处理CuI:S的掺杂剂控制
Adv Sci (Weinh). 2024 Apr;11(14):e2308188. doi: 10.1002/advs.202308188. Epub 2024 Feb 1.
2
Limits to Hole Mobility and Doping in Copper Iodide.碘化亚铜中空穴迁移率和掺杂的限制
Chem Mater. 2023 Oct 25;35(21):8995-9006. doi: 10.1021/acs.chemmater.3c01628. eCollection 2023 Nov 14.
3
Electronic structure and optical properties of doped γ-CuI scintillator: a first-principles study.
掺杂γ-CuI闪烁体的电子结构和光学性质:第一性原理研究
RSC Adv. 2023 Mar 24;13(14):9615-9623. doi: 10.1039/d2ra07988g. eCollection 2023 Mar 20.
4
Optoelectronic properties and ultrafast carrier dynamics of copper iodide thin films.碘化亚铜薄膜的光电特性及超快载流子动力学
Nat Commun. 2022 Oct 26;13(1):6346. doi: 10.1038/s41467-022-34117-8.
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A dataset of 175k stable and metastable materials calculated with the PBEsol and SCAN functionals.一个包含17.5万个使用PBEsol和SCAN泛函计算得出的稳定和亚稳材料的数据集。
Sci Data. 2022 Mar 2;9(1):64. doi: 10.1038/s41597-022-01177-w.
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Adv Sci (Weinh). 2021 May 11;8(14):2100546. doi: 10.1002/advs.202100546. eCollection 2021 Jul.