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在聚吡咯涂覆的氧化钇稳定氧化锆上进行掺钆氧化铈的电泳沉积研究。

A study on the electrophoretic deposition of gadolinium doped ceria on polypyrrole coated yttrium stabilized zirconia.

机构信息

Mechanical & Aerospace Engineering Department, Benjamin M. Statler College of Engineering & Mineral Resources, West Virginia University, Morgantown, WV 26506, USA.

C. Eugene Bennett Department of Chemistry, West Virginia University, Morgantown, WV 26506, USA.

出版信息

J Colloid Interface Sci. 2019 Nov 1;555:115-123. doi: 10.1016/j.jcis.2019.07.094. Epub 2019 Jul 30.

DOI:10.1016/j.jcis.2019.07.094
PMID:31377637
Abstract

The technological feasibility of electrophoretic deposition (EPD) of gadolinium doped ceria (GDC) on polypyrrole (PPy) coated yttrium stabilized zirconia (YSZ) has been reported. To enhance the EPD technique for the fabrication of GDC layer and to deepen the understanding of EPD, the fundamental characteristics of EPD of GDC on PPy coated YSZ were investigated. The deposition rate of GDC on PPy coated YSZ is slower than that on graphite under the same voltage. An H ion accumulation zone is formed in the vicinity of PPy coated YSZ after applying the voltage. The thickness of this ion accumulation zone initially increases and then decreases. Finally, the ion accumulation zone is replaced by an ion depletion zone. The absorbed H ions are desorbed from the particles after deposition and are then reduced to hydrogen gas. The reduction of absorbed H ions and free H ions corresponds to the deposition and the unavoidable side reaction, respectively. A new parameter, f, the percentage of electric charged associated with the reduction of absorbed H ions in the total charge, is introduced to reflect the competitive relationship between the deposition and the inevitable side reaction. f decreases with the increase of current density.

摘要

已有报道称,通过电泳沉积(EPD)在聚吡咯(PPy)涂覆的氧化钇稳定氧化锆(YSZ)上沉积掺钆氧化铈(GDC)是可行的。为了增强用于制备 GDC 层的 EPD 技术并加深对 EPD 的理解,研究了在 PPy 涂覆的 YSZ 上 EPD 沉积 GDC 的基本特性。在相同电压下,GDC 在 PPy 涂覆的 YSZ 上的沉积速率比在石墨上的沉积速率慢。在施加电压后,PPy 涂覆的 YSZ 附近会形成 H 离子积累区。该离子积累区的厚度最初增加,然后减少。最后,离子积累区被离子耗尽区取代。沉积后,吸附的 H 离子从颗粒中解吸出来,并被还原为氢气。吸附 H 离子和游离 H 离子的减少分别对应于沉积和不可避免的副反应。引入了一个新参数 f,即与总电荷中还原吸附 H 离子相关的电荷的百分比,以反映沉积和不可避免的副反应之间的竞争关系。f 随电流密度的增加而减小。

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