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块状硅纳米线/TiO异质结的定制界面促进光伏性能增强

Tailored Interfaces of the Bulk Silicon Nanowire/TiO Heterojunction Promoting Enhanced Photovoltaic Performances.

作者信息

Banerjee Debika, Benavides Jaime A, Guo Xiaohang, Cloutier Sylvain G

机构信息

Department of Electrical Engineering, École de Technologie Supérieure, 1100 Notre-Dame Ouest, Montréal, Québec H3C 1K3, Canada.

出版信息

ACS Omega. 2018 May 9;3(5):5064-5070. doi: 10.1021/acsomega.8b00522. eCollection 2018 May 31.

Abstract

We report significantly improved silicon nanowire/TiO n-n heterojunction solar cells prepared by sol-gel synthesis of TiO thin film atop vertically aligned silicon nanowire arrays obtained by facile metal-assisted wet electroless chemical etching of a bulk highly doped n-type silicon wafer. As we show here, chemical treatment of the nanowire arrays prior to depositing the sol-gel precursor has dramatic consequences on the device performance. While hydrofluoric treatment to remove the native oxide already improves significantly the device performances, hydrobromic (HBr) treatment consistently yields by far the best device performances with power conversion efficiencies ranging between 4.2 and 6.2% with fill factors up to 60% under AM 1.5G illumination. In addition to yield high-quality and easy to produce solar cell devices, these findings regarding the surface treatment of silicon nanowires with HBr suggest that HBr could contribute to the enhancement of the device performance not only for solar cells but also for other optoelectronics devices based on semiconductor nanostructures.

摘要

我们报道了通过溶胶-凝胶法在垂直排列的硅纳米线阵列顶部制备TiO薄膜而显著改进的硅纳米线/TiO n-n异质结太阳能电池,该硅纳米线阵列是通过对块状高掺杂n型硅晶片进行简便的金属辅助湿法化学蚀刻获得的。正如我们在此所示,在沉积溶胶-凝胶前驱体之前对纳米线阵列进行化学处理会对器件性能产生重大影响。虽然用氢氟酸处理以去除原生氧化物已经显著提高了器件性能,但氢溴酸(HBr)处理始终能产生迄今为止最佳的器件性能,在AM 1.5G光照下,功率转换效率在4.2%至6.2%之间,填充因子高达60%。除了能生产高质量且易于制造的太阳能电池器件外,这些关于用HBr对硅纳米线进行表面处理的发现表明,HBr不仅有助于提高太阳能电池的器件性能,还可能有助于提高基于半导体纳米结构的其他光电器件的性能。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/90bb/6642036/ff7174256ebf/ao-2018-00522f_0001.jpg

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