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利用电子束光刻写入的相位掩模通过近场全息术制造的软X射线变线间距光栅。

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask.

作者信息

Lin Dakui, Liu Zhengkun, Dietrich Kay, Sokolov Andréy, Sertsu Mewael Giday, Zhou Hongjun, Huo Tonglin, Kroker Stefanie, Chen Huoyao, Qiu Keqiang, Xu Xiangdong, Schäfers Franz, Liu Ying, Kley Ernst Bernhard, Hong Yilin

机构信息

National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hezuohua South Road 42, Hefei 230029, People's Republic of China.

Institut für Angewandte Physik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany.

出版信息

J Synchrotron Radiat. 2019 Sep 1;26(Pt 5):1782-1789. doi: 10.1107/S1600577519008245. Epub 2019 Aug 16.

DOI:10.1107/S1600577519008245
PMID:31490170
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6730620/
Abstract

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL-NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

摘要

一种采用电子束光刻（EBL）写入的相位掩模的近场全息术（NFH）来制造软X射线变线间距光栅（VLSG）的制造方法被开发出来。使用了一个面积为52 mm×30 mm且中心线密度大于3000线/mm的EBL写入的相位掩模。EBL写入的相位掩模的引入极大地简化了用于图案转移的NFH光学系统。对制造的VLSG的槽密度分布和衍射效率的表征表明，EBL-NFH方法对于实现具有相应图像特性的高精度槽密度分布是可行且有前景的。在软X射线光谱范围内垂直杂散光得到了抑制。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/a4e5936562a5/s-26-01782-fig11.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/be579b3ea4f7/s-26-01782-fig1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/889f8ce87eaa/s-26-01782-fig2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/df1d5ccd16db/s-26-01782-fig3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/e8d4cee7fe0b/s-26-01782-fig4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/d07beeb41972/s-26-01782-fig5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/153792cf38e8/s-26-01782-fig6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/8df13e31a45f/s-26-01782-fig7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/efd1f8715433/s-26-01782-fig8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/b4cf6c5c5d98/s-26-01782-fig9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/f7666104d359/s-26-01782-fig10.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/a4e5936562a5/s-26-01782-fig11.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/be579b3ea4f7/s-26-01782-fig1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/889f8ce87eaa/s-26-01782-fig2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/df1d5ccd16db/s-26-01782-fig3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/e8d4cee7fe0b/s-26-01782-fig4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/d07beeb41972/s-26-01782-fig5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/153792cf38e8/s-26-01782-fig6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/8df13e31a45f/s-26-01782-fig7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/efd1f8715433/s-26-01782-fig8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/b4cf6c5c5d98/s-26-01782-fig9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/f7666104d359/s-26-01782-fig10.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/601f/6730620/a4e5936562a5/s-26-01782-fig11.jpg

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本文引用的文献

1
Performance of a flat-field grating spectrometer for tender x-ray emission spectroscopy.用于软X射线发射光谱学的平场光栅光谱仪的性能
Appl Opt. 2018 Sep 20;57(27):7770-7777. doi: 10.1364/AO.57.007770.
2
High-resolution stigmatic spectrograph for a wavelength range of 12.5-30 nm.用于12.5 - 30纳米波长范围的高分辨率像散光谱仪。
Opt Express. 2018 Jul 23;26(15):19009-19019. doi: 10.1364/OE.26.019009.
3
Reducing Rowland ghosts in diffraction gratings by dynamic exposure near-field holography.通过动态曝光近场全息术减少衍射光栅中的罗兰鬼线。
Opt Lett. 2018 Feb 15;43(4):811-814. doi: 10.1364/OL.43.000811.
4
Large area nanoimprint enables ultra-precise x-ray diffraction gratings.大面积纳米压印可实现超精密X射线衍射光栅。
Opt Express. 2017 Sep 18;25(19):23334-23342. doi: 10.1364/OE.25.023334.
5
Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography.电子束光刻制造的高效光谱仪光栅中的罗兰鬼线抑制
Opt Express. 2017 Mar 20;25(6):6182-6191. doi: 10.1364/OE.25.006182.
6
High-efficiency in situ resonant inelastic x-ray scattering (iRIXS) endstation at the Advanced Light Source.先进光源处的高效原位共振非弹性X射线散射（iRIXS）终端站。
Rev Sci Instrum. 2017 Mar;88(3):033106. doi: 10.1063/1.4977592.
7
Evaluation of a flat-field grazing incidence spectrometer for highly charged ion plasma emission in soft x-ray spectral region from 1 to 10 nm.用于1至10纳米软X射线光谱区域中高电荷离子等离子体发射的平场掠入射光谱仪的评估。
Rev Sci Instrum. 2016 Dec;87(12):123106. doi: 10.1063/1.4971421.
8
Design of a multilayer-based collimated plane-grating monochromator for tender X-ray range.用于软X射线波段的基于多层膜的准直平面光栅单色仪的设计
J Synchrotron Radiat. 2017 Jan 1;24(Pt 1):168-174. doi: 10.1107/S1600577516017884.
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Opt Express. 2016 Jun 13;24(12):13220-30. doi: 10.1364/OE.24.013220.
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