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基于脉冲激光沉积法制备的MgZnO薄膜的低暗电流和高/比日盲光电探测器。

Solar-Blind Photodetector with Lower Dark Current and Higher / Ratio Based on MgZnO Film Deposited by Pulsed Laser Deposition Method.

作者信息

Cao Pei-Jiang, Wang Qing, Rao Ch N, Han Shun, Xu Wang-Ying, Fang Ming, Liu Xin-Ke, Zeng Yu-Xiang, Liu Wen-Jun, Zhu De-Liang, Lu You-Ming

机构信息

Shenzhen Key Laboratory of Special Functional Materials, Shenzhen Engineering Laboratory for Advanced Technology of Ceramics, Guangdong Research Center for Interfacial Engineering of Functional Materials, and College of Materials Science and Engineering, Shenzhen University, Shenzhen 518055, China.

出版信息

J Nanosci Nanotechnol. 2020 Apr 1;20(4):2550-2557. doi: 10.1166/jnn.2020.17183.

Abstract

In this study, pulsed laser deposition method (PLD) was employed to grow MgZnO films on quartz substrates. The optimal deposition temperature of 300 °C for MgZnO film was decided and MgZnO, MgZnO and MgZnO films were grown respectively using MgZnO targets with different Mg contents ( = 0.3, 0.5 and 0.7). As-deposited MgZnO film possessed the mixed-phase (hexagonal and cubic phase) structure, appropriate band gap of 4.68 eV and smaller surface roughness of 1.72 nm, and the solar-blind photodetector (PD) based on it was fabricated. The key features of our PD are the cutoff wavelength of 265 nm lying in solar-blind band, lower dark current () of 88 pA, higher peak responsivity of 0.10 A/W and bigger / ratio of 1688, which provide the new idea for the application of solar-blind PDs based on MgZnO films.

摘要

在本研究中,采用脉冲激光沉积法(PLD)在石英衬底上生长MgZnO薄膜。确定了MgZnO薄膜的最佳沉积温度为300℃,并分别使用不同Mg含量(=0.3、0.5和0.7)的MgZnO靶材生长了MgZnO薄膜、MgZnO薄膜和MgZnO薄膜。沉积态的MgZnO薄膜具有混合相(六方相和立方相)结构、4.68 eV的合适带隙和1.72 nm的较小表面粗糙度,并基于此制备了日盲光电探测器(PD)。我们的PD的关键特性包括位于日盲波段的265 nm截止波长、88 pA的较低暗电流()、0.10 A/W的较高峰值响应度和1688的较大/比,这为基于MgZnO薄膜的日盲PD的应用提供了新思路。

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