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脉冲激光沉积法制备的CsPbBr薄膜的生长及其光电应用

Growth and optoelectronic application of CsPbBr thin films deposited by pulsed-laser deposition.

作者信息

Huang Yu, Zhang Lichun, Wang Jianbu, Zhang Baoyu, Xin Lianjie, Niu Songren, Zhao Yuan, Xu Man, Chu Xinbo, Zhang Dengying, Qu Chong, Zhao FengZhou

出版信息

Opt Lett. 2019 Apr 15;44(8):1908-1911. doi: 10.1364/OL.44.001908.

Abstract

All-inorganic perovskite CsPbBr thin films have been prepared on Si (100) substrate by a pulsed-laser deposition (PLD) technique, and the morphology, structure, absorbance, and photoluminescence properties of CsPbBr thin films are investigated. A photodetector based on CsPbBr/n-Si heterojunction has been fabricated, and the performances of the device are characterized. The heterojunction photodetector exhibits diode-like rectifying behavior, and the photocurrent-to-dark-current ratio and peak responsivity of the heterojunction are approximately 168.5 and 0.6 A/W (-5  V, 520 nm), respectively. Furthermore, the CsPbBr/n-Si heterojunction photodetector exhibits fast response and recovery times. With good optoelectronic properties, CsPbBr thin films prepared by PLD should be widely applicable to high-performance photodetectors and other optoelectronic devices.

摘要

采用脉冲激光沉积(PLD)技术在Si(100)衬底上制备了全无机钙钛矿CsPbBr薄膜,并对CsPbBr薄膜的形貌、结构、吸光度和光致发光特性进行了研究。制备了基于CsPbBr/n-Si异质结的光电探测器,并对该器件的性能进行了表征。该异质结光电探测器表现出类似二极管的整流行为,异质结的光电流与暗电流之比和峰值响应率分别约为168.5和0.6 A/W(-5 V,520 nm)。此外,CsPbBr/n-Si异质结光电探测器具有快速的响应和恢复时间。通过PLD制备的CsPbBr薄膜具有良好的光电特性,应广泛应用于高性能光电探测器和其他光电器件。

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