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电-光双栅可调谐 MoS 忆阻器。

Electric and Light Dual-Gate Tunable MoS Memtransistor.

出版信息

ACS Appl Mater Interfaces. 2019 Nov 20;11(46):43344-43350. doi: 10.1021/acsami.9b14259. Epub 2019 Nov 11.

Abstract

Memtransistor is a multiterminal device combining the concepts of memristor and field-effect transistor with two-dimensional (2D) materials. The gate tunability of resistive switching in 2D memtransistor enables the multifunctional modulation and promising applications in neuromorphic network. However, the tunability of switching ratio in 2D memtransistor remains small and seriously limits its practical application. Here, we investigate a memtransistor based on a 3-layer MoS and realize the electric, light, and their combined modulations. In the electric gate mode, switching ratio is tunable in a large scale in the range 10-10. In the light gate mode, a maximum conductance change of 450% can be obtained by increasing the light power. Moreover, the switching ratio can be further improved to ∼10 through a combination of electric and light dual gating. Such a gating effect can be ascribed to the modulation of carrier density in the MoS channel. Our work provides a simple approach for achieving a high-performance multifunctional memtransistor.

摘要

忆阻器是一种将忆阻器和场效应晶体管的概念与二维(2D)材料相结合的多端器件。2D 忆阻器中电阻开关的栅极可调性实现了多功能调制,并在神经形态网络中具有广阔的应用前景。然而,2D 忆阻器的开关比可调性仍然较小,严重限制了其实际应用。在这里,我们研究了一种基于 3 层 MoS 的忆阻器,并实现了电、光及其组合调制。在电栅模式下,开关比可在 10-10 的大范围内进行调节。在光栅模式下,通过增加光功率可获得最大 450%的电导变化。此外,通过电和光双重栅极的组合,开关比可进一步提高到~10。这种门控效应可以归因于 MoS 沟道中载流子密度的调制。我们的工作为实现高性能多功能忆阻器提供了一种简单的方法。

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