Choi Ji Il, Kim Han Seul, Shin Young Shik, Johnson Christopher, Fomina Nadezda, Staley Patrick, Lang Christoph, Jang Seung Soon
Computational NanoBio Technology Laboratory, School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive NW, Atlanta, Georgia 30332-0245, United States.
National Institute of Supercomputing and Networking, Korea Institute of Science and Technology Information, Daejeon 34141, Republic of Korea.
ACS Omega. 2020 Jan 15;5(3):1717-1724. doi: 10.1021/acsomega.9b04011. eCollection 2020 Jan 28.
AlO is commonly used in modern electronic devices because of its good mechanical properties and excellent electrical insulating property. Although fundamental understanding of the electron transport in AlO is essential for its use in electronic device applications, a thorough investigation for the electron-transport mechanism has not been conducted on the structures of AlO, especially in nanometer-scale electronic device settings. In this work, electron transport via AlO for two crystallographic facets, (100) and (012), in a metal-insulator-metal junction configuration is investigated using a density functional theory-based nonequilibrium Green function method. First, it is confirmed that the transmission function, (), decreases as a function of energy in ( - ) < 0 regime, which is an intuitively expected trend. On the other hand, in the ( - ) > 0 regime, AlO(100) and AlO(012) show their own characteristic behaviors of (), presenting that major peaks are shifted toward lower energy levels under a finite bias voltage. Second, the overall conductance decay rates under zero bias are similar regardless of the crystallographic orientation, so that the contact interface seemingly has only a minor contribution to the overall conductance. A noteworthy feature at the finite bias condition is that the electrical current drastically increases as a function of bias potential (>0.7 V) in AlO(012)-based junction compared with the AlO(100) counterpart. It is elucidated that such a difference is due to the well-developed eigenchannels for electron transport in the AlO(012)-based junction. Therefore, it is evidently demonstrated that at finite bias condition, the contact interface plays a key role in determining insulating properties of AlO-Pt junctions.
由于具有良好的机械性能和优异的电绝缘性能,AlO常用于现代电子设备中。尽管对AlO中的电子输运有基本的了解对于其在电子设备应用中的使用至关重要,但尚未针对AlO的结构,特别是在纳米级电子设备环境中,对电子输运机制进行全面研究。在这项工作中,使用基于密度泛函理论的非平衡格林函数方法,研究了金属-绝缘体-金属结配置中AlO的两个晶体面(100)和(012)的电子输运。首先,证实了透射函数T(E)在(Ef - E)<0区域中随能量降低,这是一个直观预期的趋势。另一方面,在(Ef - E)>0区域中,AlO(100)和AlO(012)表现出各自的T(E)特征行为,表明在有限偏置电压下主要峰向较低能级移动。其次,零偏置下的总电导衰减率与晶体取向无关,因此接触界面似乎对总电导的贡献很小。有限偏置条件下的一个值得注意的特征是,与基于AlO(100)的结相比,基于AlO(012)的结中的电流随偏置电位(>0.7 V)急剧增加。据阐明,这种差异是由于基于AlO(012)的结中电子输运的本征通道发育良好。因此,明显证明在有限偏置条件下,接触界面在确定AlO-Pt结的绝缘性能方面起关键作用。