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硅和硅磷掺杂纳米金刚石中间隙硅缺陷的形成以及SiV光致发光带的热敏感性

Formation of interstitial silicon defects in Si- and Si,P-doped nanodiamonds and thermal susceptibilities of SiV photoluminescence band.

作者信息

Choi Sumin, Agafonov Viatcheslav N, Davydov Valery A, Kulikova Ludmila F, Plakhotnik Taras

机构信息

School of Mathematics and Physics, The University of Queensland, QLD 4072, Australia.

出版信息

Nanotechnology. 2020 May 15;31(20):205709. doi: 10.1088/1361-6528/ab72bb. Epub 2020 Feb 4.

DOI:10.1088/1361-6528/ab72bb
PMID:32018241
Abstract

We have produced two types of synthetic nanodiamonds Si- and Si,P-doped and have characterized the thermal susceptibilities of the spectral band of silicon-vacancy (SiV) centers at approximately 740 nm in each case. The covered temperature range from 295 to 350 K is of interest for thermometry in biological systems. Comparison of the relative brightness of the Si- and Si,P-doped crystals shows that phosphorous significantly increases average concentration and homogeneity of distribution of SiV centers in nanodiamonds. Moreover, linear dependence on temperature of the zero-phonon line width in Si-doped crystals is 0.061(2) nm K but is 0.047(3) nm K, about 35% smaller in Si,P-doped nanodiamonds. This proves control of SiV properties with additional chemical doping and close proximity of Si and P atoms.

摘要

我们制备了两种类型的合成纳米金刚石,即硅掺杂和硅磷共掺杂的纳米金刚石,并分别表征了每种情况下硅空位(SiV)中心在约740 nm光谱带的热磁化率。295至350 K的温度范围对生物系统中的温度测量很有意义。硅掺杂和硅磷共掺杂晶体相对亮度的比较表明,磷显著提高了纳米金刚石中SiV中心的平均浓度和分布均匀性。此外,硅掺杂晶体中零声子线宽对温度的线性依赖关系为0.061(2) nm/K,而在硅磷共掺杂的纳米金刚石中为0.047(3) nm/K,约小35%。这证明了通过额外的化学掺杂以及硅和磷原子的紧密相邻对SiV性质进行了调控。

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