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纳米球光刻技术:化学蚀刻和退火顺序对纳米金属阵列的形状和光谱的影响

Nanosphere lithography: the effect of chemical etching and annealing sequence on the shape and spectrum of nano-metal arrays.

作者信息

Bayat Farzaneh, Tajalli Habib

机构信息

Department of Physics, Azarbaijan Shahid Madani University, Tabriz, Iran.

Photonics Group, Research Institute for Applied Physics and Astronomy, University of Tabriz, Tabriz, Iran.

出版信息

Heliyon. 2020 Feb 11;6(2):e03382. doi: 10.1016/j.heliyon.2020.e03382. eCollection 2020 Feb.

Abstract

In this paper, it is shown that the sequence of chemical etching of the template and annealing has a significant effect on the shape and spectrum of the nano-metal arrays fabricated by nanosphere lithography (NSL). Higher nanoparticles with sharp edges are fabricated as a consequence of annealing the metal coated template, which is a 2d colloidal crystal, before chemical etching. Consequently, the absorption spectra of the fabricated sample become much sharper, in comparison with the one that is fabricated with the reversed order and also a shift is observed in the peak wavelength. The achieved result has practical importance for the applications of these nano-metal arrays in localized surface plasmon resonance (LSPR) based sensors.

摘要

本文表明,模板的化学蚀刻顺序和退火对通过纳米球光刻(NSL)制备的纳米金属阵列的形状和光谱有显著影响。在化学蚀刻之前,对作为二维胶体晶体的金属包覆模板进行退火处理,从而制备出边缘尖锐的更高纳米颗粒。因此,与按相反顺序制备的样品相比,所制备样品的吸收光谱变得更加尖锐,并且在峰值波长处也观察到了偏移。所取得的结果对于这些纳米金属阵列在基于局域表面等离子体共振(LSPR)的传感器中的应用具有实际意义。

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