镁、铜和镍掺杂剂对非晶态二氧化钛薄膜光催化活性的影响。

Influence of Mg, Cu, and Ni Dopants on Amorphous TiO Thin Films Photocatalytic Activity.

作者信息

Kavaliunas Vytautas, Krugly Edvinas, Sriubas Mantas, Mimura Hidenori, Laukaitis Giedrius, Hatanaka Yoshinori

机构信息

Department of Physics: Faculty of Mathematics and Natural Sciences, Kaunas University of Technology, Studentų str. 50, 51368 Kaunas, Lithuania.

Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-Ku, Hamamatsu, Shizuoka 432-8011, Japan.

出版信息

Materials (Basel). 2020 Feb 17;13(4):886. doi: 10.3390/ma13040886.

DOI:10.3390/ma13040886

PMID:32079187

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7079588/

Abstract

The present study investigates Mg (0 ÷ 17.5 wt %), Cu (0 ÷ 21 wt %) and Ni (0 ÷ 20.2 wt %) dopants (M-doped) influence on photocatalytic activity of amorphous TiO thin films. Magnetron sputtering was used for the deposition of M-doped TiO thin films. According to SEM/EDS surface analysis, the magnetron sputtering technique allows making M-doped TiO thin films with high uniformity and high dopant dispersion. Photocatalysis efficiency analysis was set in oxalic acid under UV irradiation. In accordance with the TOC (total organic carbon) measurements followed by the apparent rate constant () results, the dopants' concentration peak value was dopant-dependent; for Mg/TiO, it is 0.9% (-0.01866 cm), for Cu/TiO, it is 0.6% (-0.02221 cm), and for Ni/TiO, it is 0.5% (-0.01317 cm). The obtained results clearly state that a concentration of dopants in TiO between 0.1% and 0.9% results in optimal photocatalytic activity.

摘要

本研究调查了镁（0÷17.5 wt%）、铜（0÷21 wt%）和镍（0÷20.2 wt%）掺杂剂（M掺杂）对非晶TiO薄膜光催化活性的影响。采用磁控溅射法沉积M掺杂的TiO薄膜。根据扫描电子显微镜/能谱表面分析，磁控溅射技术能够制备出具有高均匀性和高掺杂剂分散性的M掺杂TiO薄膜。在紫外光照射下，于草酸中进行光催化效率分析。根据总有机碳（TOC）测量结果以及表观速率常数（）结果，掺杂剂的浓度峰值取决于掺杂剂；对于Mg/TiO，为0.9%（-0.01866 cm），对于Cu/TiO，为0.6%（-0.02221 cm），对于Ni/TiO，为0.5%（-0.01317 cm）。所得结果清楚地表明，TiO中掺杂剂浓度在0.1%至0.9%之间会导致最佳光催化活性。