Chiaramonti Ann N, Miaja-Avila Luis, Caplins Benjamin W, Blanchard Paul T, Diercks David R, Gorman Brian P, Sanford Norman A
Material Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO80305, USA.
Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO80305, USA.
Microsc Microanal. 2020 Apr;26(2):258-266. doi: 10.1017/S1431927620000203.
This paper describes initial experimental results from an extreme ultraviolet (EUV) radiation-pulsed atom probe microscope. Femtosecond-pulsed coherent EUV radiation of 29.6 nm wavelength (41.85 eV photon energy), obtained through high harmonic generation in an Ar-filled hollow capillary waveguide, successfully triggered controlled field ion emission from the apex of amorphous SiO2 specimens. The calculated composition is stoichiometric within the error of the measurement and effectively invariant of the specimen base temperature in the range of 25 K to 150 K. Photon energies available in the EUV band are significantly higher than those currently used in the state-of-the-art near-ultraviolet laser-pulsed atom probe, which enables the possibility of additional ionization and desorption pathways. Pulsed coherent EUV light is a new and potential alternative to near-ultraviolet radiation for atom probe tomography.
本文描述了极紫外（EUV）辐射脉冲原子探针显微镜的初步实验结果。通过在充满氩气的空心毛细管波导中进行高次谐波产生获得的波长为29.6 nm（光子能量为41.85 eV）的飞秒脉冲相干EUV辐射，成功触发了非晶态SiO2样品顶端的可控场离子发射。计算得到的成分在测量误差范围内符合化学计量比，并且在25 K至150 K的样品基底温度范围内基本不变。EUV波段可用的光子能量明显高于目前最先进的近紫外激光脉冲原子探针所使用的光子能量，这使得额外的电离和解吸途径成为可能。脉冲相干EUV光是用于原子探针层析成像的近紫外辐射的一种新的潜在替代方案。
