Mielenz Klaus D
J Res Natl Bur Stand A Phys Chem. 1960 Nov-Dec;64A(6):487-495. doi: 10.6028/jres.064A.047. Epub 1960 Dec 1.
A theory is developed for dielectric multilayer coatings in which the layers depart from calculated thickness. The theory is applied to alternating systems of quarter wave layers of ZnS and MgF. The effects of thickness errors are: (1) A shift of the wavelength at which maximum reflectance occurs; and (2) a change in phase shift upon reflection. The magnitude of these effects, and also their dependence on various parameters, are determined. Statistical tolerances for layer thicknesses are computed for given tolerances on the multilayer performance. The accuracy required for producing dielectric interference filters is up to about 40 times higher than the accuracy sufficient for the production of dielectric mirrors and beam splitters. Various techniques of experimentally controlling film thicknesses, and their accuracies, are discussed. The production of mirrors and beam splitters deviating from theoretical maximum reflectance by only 1 percent seems to be possible with Dufour's simple single photocell method of monitoring film thicknesses. With more precise methods, such as those developed by Giacomo and Jacquinot, or Traub, the production of interference filters appears to be possible to within plus or minus one half their half widths.
本文提出了一种适用于各层厚度偏离计算值的介质多层膜涂层的理论。该理论应用于硫化锌和氟化镁四分之一波长层的交替系统。厚度误差的影响包括：（1）最大反射率出现时的波长偏移；（2）反射时相移的变化。确定了这些影响的大小及其对各种参数的依赖性。针对多层膜性能的给定公差，计算了层厚度的统计公差。制造介质干涉滤光片所需的精度比制造介质镜和分束器所需的足够精度高出约40倍。讨论了实验控制膜厚及其精度的各种技术。使用杜福尔简单的单光电管监测膜厚方法，似乎有可能制造出反射率仅偏离理论最大值1%的镜子和分束器。采用更精确的方法，如贾科莫和雅克诺或特劳布开发的方法，制造干涉滤光片的误差似乎有可能控制在其半高宽的正负二分之一范围内。
