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铜离子辅助沉淀蚀刻法用于硫量子点的发光增强组装

Copper-Ion-Assisted Precipitation Etching Method for the Luminescent Enhanced Assembling of Sulfur Quantum Dots.

作者信息

Li Qi-Le, Shi Lin-Xing, Du Ke, Qin Yong, Qu Shu-Jie, Xia De-Qian, Zhou Zhen, Huang Zeng-Guang, Ding Shou-Nian

机构信息

School of Science, Jiangsu Ocean University, Lianyungang 222005, P. R. China.

Jiangsu Pacific Quartz Co., Ltd., Lianyungang 222005, P. R. China.

出版信息

ACS Omega. 2020 Mar 3;5(10):5407-5411. doi: 10.1021/acsomega.9b04465. eCollection 2020 Mar 17.

Abstract

In this study, we report a metal-ion-assisted precipitation etching strategy that can be used to manipulate the optical properties associated with the assembling of sulfur quantum dots (S dots) using copper ions. Transmission electron microscopy confirmed that the S dots were mainly distributed within 50-80 nm and that they exhibited an ambiguous boundary. After the post-synthetic Cu-assisted modification was completed, the assisted precipitation-etching S dots (APE-S dots) were observed to exhibit a relatively clear boundary with a high fluorescence (FL) quantum yield (QY) of 32.8%. Simultaneously, the Fourier transform infrared radiation, X-ray photoelectron spectra, and time-resolved FL decay spectra were used to illustrate the improvement in the FL QY of the APE-S dots.

摘要

在本研究中,我们报告了一种金属离子辅助沉淀蚀刻策略,该策略可用于利用铜离子来调控与硫量子点(S点)组装相关的光学性质。透射电子显微镜证实,S点主要分布在50 - 80纳米范围内,且边界模糊。在合成后铜辅助修饰完成后,观察到辅助沉淀蚀刻的S点(APE - S点)具有相对清晰的边界,荧光(FL)量子产率(QY)高达32.8%。同时,利用傅里叶变换红外辐射、X射线光电子能谱和时间分辨荧光衰减光谱来说明APE - S点的FL QY的提高。

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