Low-loss metasurface optics down to the deep ultraviolet region.

Shrinking conventional optical systems to chip-scale dimensions will benefit custom applications in imaging, displaying, sensing, spectroscopy, and metrology. Towards this goal, metasurfaces-planar arrays of subwavelength electromagnetic structures that collectively mimic the functionality of thicker conventional optical elements-have been exploited at frequencies ranging from the microwave range up to the visible range. Here, we demonstrate high-performance metasurface optical components that operate at ultraviolet wavelengths, including wavelengths down to the record-short deep ultraviolet range, and perform representative wavefront shaping functions, namely, high-numerical-aperture lensing, accelerating beam generation, and hologram projection. The constituent nanostructured elements of the metasurfaces are formed of hafnium oxide-a loss-less, high-refractive-index dielectric material deposited using low-temperature atomic layer deposition and patterned using high-aspect-ratio Damascene lithography. This study opens the way towards low-form factor, multifunctional ultraviolet nanophotonic platforms based on flat optical components, enabling diverse applications including lithography, imaging, spectroscopy, and quantum information processing.