Shi Xiaohui, Wu Mei, Lai Zhengxun, Li Xujing, Gao Peng, Mi Wenbo
Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, School of Science, Tianjin University, Tianjin 300354, China.
International Center for Quantum Materials, School of Physics, Peking University, Beijing 100871, China.
ACS Appl Mater Interfaces. 2020 Jun 17;12(24):27394-27404. doi: 10.1021/acsami.0c08042. Epub 2020 Jun 4.
The strain modulation on the magnetic and electronic transport properties of the ferromagnetic films is one of the hot topics due to the practical applications in flexible and wearable spintronic devices. However, the large strain-induced saturation magnetization and resistance change is not easy to achieve because most of the ferromagnetic films deposited on flexible substrates are polycrystalline or amorphous. Here, the flexible epitaxial γ'-FeN/mica films are fabricated by facing-target reactive sputtering. At a tensile strain with a radius of curvature (ROC) of 3 mm, the saturation magnetization () of the γ'-FeN/mica film is tailored significantly with a maximal variation of 210%. Meanwhile, the magnetic anisotropy was broadly tunable at different strains, where the out-of-plane at a tensile strain of ROC = 2 mm is six times larger than that at the unbent state. Besides, the strain-tailored longitudinal resistance and anomalous Hall resistivity ρ appear where the drop of (ρ) reaches 5% (22%) at a tensile strain of ROC = 3 mm. The shift of the nitrogen position in the γ'-FeN unit cell at different bending strains plays a key role in the strain-tailored magnetic and electronic transport properties. The flexible epitaxial γ'-FeN films have the potential applications in magneto- and electromechanical wearable spintronic devices.
由于在柔性和可穿戴自旋电子器件中的实际应用,铁磁薄膜的应变调制对其磁学和电子输运性质的影响是热门研究课题之一。然而,由于大多数沉积在柔性衬底上的铁磁薄膜是多晶或非晶的,很难实现大应变诱导的饱和磁化强度和电阻变化。在此,通过对靶反应溅射制备了柔性外延γ'-FeN/云母薄膜。在曲率半径(ROC)为3 mm的拉伸应变下,γ'-FeN/云母薄膜的饱和磁化强度()得到显著调整,最大变化率为210%。同时,在不同应变下磁各向异性可广泛调节,其中在ROC = 2 mm的拉伸应变下,面外方向比未弯曲状态下大六倍。此外,在应变调整的纵向电阻和反常霍尔电阻率ρ出现,在ROC = 3 mm的拉伸应变下,(ρ)的下降达到5%(22%)。γ'-FeN晶胞中氮位置在不同弯曲应变下的移动在应变调整的磁学和电子输运性质中起关键作用。柔性外延γ'-FeN薄膜在磁电机械可穿戴自旋电子器件中具有潜在应用。