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基于含氯化钾添加剂的CHNHPbI Cl薄膜的多级电阻式开关存储器。

Multilevel Resistive Switching Memory Based on a CHNHPbI Cl Film with Potassium Chloride Additives.

作者信息

Lv Fengzhen, Ling Kang, Zhong Tingting, Liu Fuchi, Liang Xiaoguang, Zhu Changming, Liu Jun, Kong Wenjie

机构信息

College of Physics and Technology, Guangxi Normal University, Yucai Road, Guilin, 541000, China.

出版信息

Nanoscale Res Lett. 2020 Jun 5;15(1):126. doi: 10.1186/s11671-020-03356-3.

Abstract

High-quality CHNHPbI Cl (MAPIC) films were prepared using potassium chloride (KCl) as an additive on indium tin oxide (ITO)-coated glass substrates using a simple one-step and low-temperature solution reaction. The Au/KCl-MAPIC/ITO/glass devices exhibited obvious multilevel resistive switching behavior, moderate endurance, and good retention performance. Electrical conduction analysis indicated that the resistive switching behavior of the KCl-doped MAPIC films was primarily attributed to the trap-controlled space-charge-limited current conduction that was caused by the iodine vacancies in the films. Moreover, the modulations of the barrier in the Au/KCl-MAPIC interface under bias voltages were thought to be responsible for the resistive switching in the carrier injection trapping/detrapping process.

摘要

采用氯化钾(KCl)作为添加剂,通过简单的一步低温溶液反应,在氧化铟锡(ITO)涂层玻璃基板上制备了高质量的CHNHPbI Cl(MAPIC)薄膜。Au/KCl-MAPIC/ITO/玻璃器件表现出明显的多级电阻开关行为、适度的耐久性和良好的保持性能。导电分析表明,KCl掺杂的MAPIC薄膜的电阻开关行为主要归因于由薄膜中的碘空位引起的陷阱控制的空间电荷限制电流传导。此外,偏置电压下Au/KCl-MAPIC界面处势垒的调制被认为是载流子注入俘获/脱俘获过程中电阻开关的原因。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/57b0/7275113/173a381e8483/11671_2020_3356_Fig1_HTML.jpg

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