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用于透明薄膜晶体管和互补电子器件的室温溶液合成p型碘化亚铜半导体

Room-Temperature Solution-Synthesized p-Type Copper(I) Iodide Semiconductors for Transparent Thin-Film Transistors and Complementary Electronics.

作者信息

Liu Ao, Zhu Huihui, Park Won-Tae, Kang Seok-Ju, Xu Yong, Kim Myung-Gil, Noh Yong-Young

机构信息

Department of Energy and Materials Engineering, Dongguk University, 30 Pildong-ro, 1-gil, Jung-gu, Seoul, 04620, Republic of Korea.

Department of Chemistry, Chung-Ang University, Seoul, 06974, Republic of Korea.

出版信息

Adv Mater. 2018 Jul 4:e1802379. doi: 10.1002/adma.201802379.

Abstract

Here, room-temperature solution-processed inorganic p-type copper iodide (CuI) thin-film transistors (TFTs) are reported for the first time. The spin-coated 5 nm thick CuI film has average hole mobility (µ ) of 0.44 cm V s and on/off current ratio of 5 × 10 . Furthermore, µ increases to 1.93 cm V s and operating voltage significantly reduces from 60 to 5 V by using a high permittivity ZrO dielectric layer replacing traditional SiO . Transparent complementary inverters composed of p-type CuI and n-type indium gallium zinc oxide TFTs are demonstrated with clear inverting characteristics and voltage gain over 4. These outcomes provide effective approaches for solution-processed inorganic p-type semiconductor inks and related electronics.

摘要

在此,首次报道了室温溶液法制备的无机p型碘化铜(CuI)薄膜晶体管(TFT)。旋涂的5nm厚CuI薄膜的平均空穴迁移率(µ)为0.44cm²V⁻¹s⁻¹,开/关电流比为5×10⁴。此外,通过使用高介电常数的ZrO₂介电层取代传统的SiO₂,µ增加到1.93cm²V⁻¹s⁻¹,工作电压从60V显著降低到5V。由p型CuI和n型铟镓锌氧化物TFT组成的透明互补反相器具有清晰的反相特性和超过4的电压增益。这些成果为溶液法制备无机p型半导体油墨及相关电子产品提供了有效途径。

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