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通过金属有机化学气相沉积法实现单片生长的同轴GaInN/GaN多量子壳层纳米线的制备

Development of Monolithically Grown Coaxial GaInN/GaN Multiple Quantum Shell Nanowires by MOCVD.

作者信息

Ito Kazuma, Lu Weifang, Sone Naoki, Miyamoto Yoshiya, Okuda Renji, Iwaya Motoaki, Tekeuchi Tetsuya, Kamiyama Satoshi, Akasaki Isamu

机构信息

Department of Materials Science and Engineering, Meijo University, Nagoya 468-8502, Japan.

Koito Manufacturing Co., LTD., Tokyo 108-8711, Japan.

出版信息

Nanomaterials (Basel). 2020 Jul 10;10(7):1354. doi: 10.3390/nano10071354.

Abstract

Broadened emission was demonstrated in coaxial GaInN/GaN multiple quantum shell (MQS) nanowires that were monolithically grown by metalorganic chemical vapor deposition. The non-polar GaInN/GaN structures were coaxially grown on n-core nanowires with combinations of three different diameters and pitches. To broaden the emission band in these three nanowire patterns, we varied the triethylgallium (TEG) flow rate and the growth temperature of the quantum barriers and wells, and investigated their effects on the In incorporation rate during MQS growth. At higher TEG flow rates, the growth rate of MQS and the In incorporation rate were promoted, resulting in slightly higher cathodoluminescence (CL) intensity. An enhancement up to 2-3 times of CL intensity was observed by escalating the growth temperature of the quantum barriers to 800 °C. Furthermore, decreasing the growth temperature of the quantum wells redshifted the peak wavelength without reducing the MQS quality. Under the modified growth sequence, monolithically grown nanowires with a broaden emission was achieved. Moreover, it verified that reducing the filling factor (pitch) can further promote the In incorporation probability on the nanowires. Compared with the conventional film-based quantum well LEDs, the demonstrated monolithic coaxial GaInN/GaN nanowires are promising candidates for phosphor-free white and micro light-emitting diodes (LEDs).

摘要

通过金属有机化学气相沉积法单片生长的同轴GaInN/GaN多量子壳(MQS)纳米线表现出了展宽发射。非极性GaInN/GaN结构在具有三种不同直径和间距组合的n型芯纳米线上同轴生长。为了展宽这三种纳米线图案中的发射带,我们改变了三乙基镓(TEG)的流量以及量子势垒和量子阱的生长温度,并研究了它们对MQS生长过程中铟掺入率的影响。在较高的TEG流量下,MQS的生长速率和铟掺入率得到提高,导致阴极发光(CL)强度略有增加。通过将量子势垒的生长温度提高到800°C,观察到CL强度增强了2至3倍。此外,降低量子阱的生长温度会使峰值波长红移,而不会降低MQS的质量。在修改后的生长序列下,实现了具有展宽发射的单片生长纳米线。此外,还证实了降低填充因子(间距)可以进一步提高纳米线上铟的掺入概率。与传统的基于薄膜的量子阱发光二极管相比,所展示的单片同轴GaInN/GaN纳米线有望成为无荧光粉白光和微型发光二极管(LED)的候选材料。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7384/7408062/3a0aae707ae6/nanomaterials-10-01354-g001.jpg

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