Hsieh Yu-Ling, Su Wen-Hsuan, Huang Cheng-Chun, Su Ching-Yuan
Department of Mechanical Engineering, National Central University, Tao-Yuan 32001, Taiwan.
Graduate Institute of Energy Engineering, National Central University, Tao-Yuan 32001, Taiwan.
ACS Appl Mater Interfaces. 2020 Aug 19;12(33):37375-37383. doi: 10.1021/acsami.0c11129. Epub 2020 Aug 5.
Most two-dimensional (2D) semiconductors suffer from intrinsic instability under ambient conditions, especially 2D black phosphorus (BP). Although much effort has been made to study the passivation of 2D materials against corrosion by oxygen and water molecules, facile and effective passivation with long-term stability is still challenging; in particular, selective passivation, which is critical for integration into nanoelectronics, is still lacking. Here, we develop a novel passivation route for BP using a fluorinated self-assembled thin film of PFSA (perfluorosulfonic acid, PFSA), where the surface modifier with high hydrophobicity on BP presents extremely stable characteristics over five months under ambient conditions. Moreover, we report for the first time cleaning and selective fluorination of only BP flakes on a SiO/Si substrate by a spin-coating process followed by ultrasonication, which was attributed to the formation of P-F covalent bonds on the BP surface. Selectively fluorinated BP shows not only enhanced stability in air but also electrical properties of the BP field-effect transistor (FET), with the on-current of the BP FET increasing and presenting enhanced carrier mobility (125 cm V s) and on/off ratio (10). This significant finding sheds light on fabricating vertical 2D heterostructures to realize high performance and reliability with versatile 2D materials. This work demonstrates an emerging passivation approach for long-term stability together with superior electrical properties, which paves the way for integrating 2D semiconductors into critical channel materials in FETs that are favorable for next-generation digital logic circuits.
大多数二维(2D)半导体在环境条件下存在固有不稳定性,特别是二维黑磷(BP)。尽管人们已付出诸多努力来研究二维材料针对氧气和水分子腐蚀的钝化作用,但实现简便且有效的长期稳定钝化仍具有挑战性;尤其是对于集成到纳米电子学中至关重要的选择性钝化,目前仍然欠缺。在此,我们开发了一种使用全氟磺酸(PFSA)的氟化自组装薄膜对BP进行钝化的新途径,其中BP表面具有高疏水性的表面改性剂在环境条件下五个多月呈现出极其稳定的特性。此外,我们首次报道了通过旋涂工艺然后超声处理,仅对SiO/Si衬底上的BP薄片进行清洁和选择性氟化,这归因于BP表面形成了P-F共价键。选择性氟化的BP不仅在空气中稳定性增强,而且BP场效应晶体管(FET)的电学性能也得到提升,BP FET的导通电流增加,呈现出增强的载流子迁移率(125 cm² V⁻¹ s⁻¹)和开/关比(10)。这一重要发现为利用通用二维材料制造垂直二维异质结构以实现高性能和可靠性提供了思路。这项工作展示了一种用于长期稳定性以及卓越电学性能的新兴钝化方法,为将二维半导体集成到FET中的关键沟道材料铺平了道路,这有利于下一代数字逻辑电路。