Paustenbach D J
McLaren-Chemrisk, Rancho Cordova, California 95670.
J Toxicol Environ Health. 1988;23(1):29-75. doi: 10.1080/15287398809531094.
This risk assessment evaluates the potential human hazards of adverse developmental effects posed by exposure to 2-ethoxyethanol (2-EE), 2-ethoxyethanol acetate (2-EEA), 2-methoxyethanol (2-ME), and 2-methoxyethanol acetate (2-MEA) as they are currently used in semiconductor manufacturing. These glycol ethers are contained in positive photoresists used in the wafer fabrication process. The available data on the developmental toxicology of these glycol ethers indicates that each can selectively affect the offspring of pregnant animals that have been exposed to relatively low vapor concentrations. For these chemicals, the ratio of the lowest dose which adversely affected the pregnant animals (A) and the lowest dose which produced developmental effects in offspring (D), e.g., A/D ranged from 1-5. Approximately 400 workplace air samples of 4-8 h duration, both personal and area, from seven different companies were used to assess the degree of inhalation exposure during the manufacture of wafers. The geometric mean results obtained during personal sampling of workplace air for 2-EE, 2-EEA, 2-ME, and 2-MEA were 0.36, 0.02, 0.10, and 0.01 ppm, respectively. These levels are 14- to 500-fold lower than the applicable threshold limit value (TLV) currently recommended by the American Conference of Governmental Industrial Hygienists (ACGIH). Specifically, the margins of safety between the typical occupational exposure and the TLV for 2-ME, 2-EE, 2-MEA, and 2-EEA are 50, 14, 500, and 250, respectively. The TLVs for these chemicals were set at levels considered sufficiently low to protect workers and their offspring from adverse effects and are about 2- to 10-fold lower than the various no-observed-effect levels (NOELs) obtained in animal tests. Based on more recent data, lower TLVs are indicated. The safety-factor approach, rather than mathematical models developed for estimating cancer risks, was used in this analysis. Historical data have shown that the application of safety factors of 10-100 to the NOEL, as determined in Segment II developmental toxicology tests in animals, should be adequate to protect humans. In its risk assessment guidelines, the U.S. Environmental Protection Agency (EPA) selected the uncertainty-factor approach as the most reasonable one for evaluating the hazards of developmental toxicants. This assessment indicates that the airborne concentrations of these glycol ethers in the semiconductor industry are, in general, sufficiently low to protect employees against their adverse developmental and reproductive effects as well as any other toxic effects as long as dermal exposure is minimal.
本风险评估评估了半导体制造中目前使用的2-乙氧基乙醇(2-EE)、乙酸2-乙氧基乙酯(2-EEA)、2-甲氧基乙醇(2-ME)和乙酸2-甲氧基乙酯(2-MEA)所造成的不良发育影响对人类的潜在危害。这些乙二醇醚包含在晶圆制造过程中使用的正性光刻胶中。关于这些乙二醇醚发育毒理学的现有数据表明,每种物质都能选择性地影响暴露于相对低蒸汽浓度的怀孕动物的后代。对于这些化学品,对怀孕动物产生不利影响的最低剂量(A)与对后代产生发育影响的最低剂量(D)之比,例如A/D范围为1至5。从7家不同公司采集了约400个时长为4 - 8小时的工作场所空气样本,包括个人样本和区域样本,用于评估晶圆制造过程中的吸入暴露程度。在工作场所空气中对2-EE、2-EEA、2-ME和2-MEA进行个人采样时获得的几何平均结果分别为0.36、0.02、0.10和0.01 ppm。这些水平比美国政府工业卫生学家会议(ACGIH)目前推荐的适用阈限值(TLV)低14至500倍。具体而言,2-ME、2-EE、2-MEA和2-EEA的典型职业暴露与TLV之间的安全边际分别为50、14、500和250。这些化学品的TLV设定在被认为足够低的水平,以保护工人及其后代免受不利影响,并且比动物试验中获得的各种未观察到效应水平(NOEL)低约2至10倍。根据最新数据,表明需要更低的TLV。本分析采用安全系数法,而非用于估计癌症风险的数学模型。历史数据表明,对动物第二阶段发育毒理学试验中确定的NOEL应用10至100的安全系数,应足以保护人类。在美国环境保护局(EPA)的风险评估指南中,选择不确定性系数法作为评估发育毒物危害最合理的方法。本评估表明,只要皮肤暴露最小,半导体行业中这些乙二醇醚的空气传播浓度总体上足够低,可保护员工免受其不良发育和生殖影响以及任何其他毒性影响。