Park Tae Wan, Byun Myunghwan, Jung Hyunsung, Lee Gyu Rac, Park Jae Hong, Jang Hyun-Ik, Lee Jung Woo, Kwon Se Hun, Hong Seungbum, Lee Jong-Heun, Jung Yeon Sik, Kim Kwang Ho, Park Woon Ik
Electronic Convergence Materials Division, Korea Institute of Ceramic Engineering & Technology (KICET) 101 Soho-ro, Jinju 52851, Republic of Korea.
Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea.
Sci Adv. 2020 Jul 29;6(31):eabb6462. doi: 10.1126/sciadv.abb6462. eCollection 2020 Jul.
Nanotransfer printing (nTP) has attracted considerable attention due to its good pattern resolution, process simplicity, and cost-effectiveness. However, the development of a large-area nTP process has been hampered by critical reliability issues related to the uniform replication and regular transfer printing of functional nanomaterials. Here, we present a very practical thermally assisted nanotransfer printing (T-nTP) process that can easily produce well-ordered nanostructures on an 8-inch wafer via the use of a heat-rolling press system that provides both uniform pressure and heat. We also demonstrate various complex pattern geometries, such as wave, square, nut, zigzag, and elliptical nanostructures, on diverse substrates via T-nTP. Furthermore, we demonstrate how to obtain a high-density crossbar metal-insulator-metal memristive array using a combined method of T-nTP and directed self-assembly. We expect that the state-of-the-art T-nTP process presented here combined with other emerging patterning techniques will be especially useful for the large-area nanofabrication of various devices.
纳米转移印刷（nTP）因其良好的图案分辨率、工艺简单性和成本效益而备受关注。然而，与功能纳米材料的均匀复制和规则转移印刷相关的关键可靠性问题阻碍了大面积nTP工艺的发展。在此，我们展示了一种非常实用的热辅助纳米转移印刷（T-nTP）工艺，该工艺可通过使用提供均匀压力和热量的热压系统，在8英寸晶圆上轻松制备出有序的纳米结构。我们还通过T-nTP在各种衬底上展示了各种复杂的图案几何形状，如波浪形、方形、螺母形、之字形和椭圆形纳米结构。此外，我们展示了如何使用T-nTP和定向自组装相结合的方法获得高密度交叉bar金属-绝缘体-金属忆阻阵列。我们预计，本文介绍的先进T-nTP工艺与其他新兴图案化技术相结合，将对各种器件的大面积纳米制造特别有用。
