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钙钛矿核壳纳米线晶体管:界面转移掺杂与表面钝化

Perovskite Core-Shell Nanowire Transistors: Interfacial Transfer Doping and Surface Passivation.

作者信息

Meng You, Lai Zhengxun, Li Fangzhou, Wang Wei, Yip SenPo, Quan Quan, Bu Xiuming, Wang Fei, Bao Yan, Hosomi Takuro, Takahashi Tsunaki, Nagashima Kazuki, Yanagida Takeshi, Lu Jian, Ho Johnny C

机构信息

Shenzhen Research Institute, City University of Hong Kong, Shenzhen 518057, P. R. China.

Department of Mechanical Engineering, City University of Hong Kong, Kowloon 999077, Hong Kong SAR.

出版信息

ACS Nano. 2020 Oct 27;14(10):12749-12760. doi: 10.1021/acsnano.0c03101. Epub 2020 Sep 25.

DOI:10.1021/acsnano.0c03101
PMID:32910641
Abstract

While halide perovskite electronics are rapidly developing, they are greatly limited by the inferior charge transport and poor stability. In this work, effective surface charge transfer doping of vapor-liquid-solid (VLS)-grown single-crystalline cesium lead bromide perovskite (CsPbBr) nanowires (NWs) molybdenum trioxide (MoO) surface functionalization is achieved. Once fabricated into NW devices, due to the efficient interfacial charge transfer and reduced impurity scattering, a 15× increase in the field-effect hole mobility (μ) from 1.5 to 23.3 cm/(V s) is accomplished after depositing the 10 nm thick MoO shell. This enhanced mobility is already better than any mobility value reported for perovskite field-effect transistors (FETs) to date. The photodetection performance of these CsPbBr/MoO core-shell NWs is also investigated to yield a superior responsivity () up to 2.36 × 10 A/W and an external quantum efficiency (EQE) of over 5.48 × 10% toward the 532 nm regime. Importantly, the MoO shell can provide excellent surface passivation to the CsPbBr NW core that minimizes the diffusion of detrimental water and oxygen molecules, improving the air stability of CsPbBr/MoO core-shell NW devices. All these findings evidently demonstrate the surface doping as an enabling technology to realize high-mobility and air-stable low-dimensional halide perovskite devices.

摘要

尽管卤化物钙钛矿电子学正在迅速发展,但它们受到电荷传输性能不佳和稳定性较差的极大限制。在这项工作中,实现了对气-液-固(VLS)生长的单晶溴化铯铅钙钛矿(CsPbBr)纳米线(NWs)进行有效的表面电荷转移掺杂和三氧化钼(MoO)表面功能化。一旦制成NW器件,由于有效的界面电荷转移和减少的杂质散射,在沉积10nm厚的MoO壳层后,场效应空穴迁移率(μ)从1.5cm²/(V·s)提高了15倍,达到23.3cm²/(V·s)。这种增强的迁移率已经优于迄今为止报道的任何钙钛矿场效应晶体管(FET)的迁移率值。还研究了这些CsPbBr/MoO核壳NWs的光电探测性能,在532nm波段产生了高达2.36×10⁻²A/W的优异响应度(R)和超过5.48×10²%的外量子效率(EQE)。重要的是,MoO壳层可以为CsPbBr NW核提供出色的表面钝化,最大限度地减少有害水和氧分子的扩散,提高CsPbBr/MoO核壳NW器件的空气稳定性。所有这些发现显然证明了表面掺杂是实现高迁移率和空气稳定的低维卤化物钙钛矿器件的一项赋能技术。

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