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用于基于小带隙半导体的高性能和低功耗应用的增强型互补金属氧化物半导体逻辑

Strengthened Complementary Metal-Oxide-Semiconductor Logic for Small-Band-Gap Semiconductor-Based High-Performance and Low-Power Application.

作者信息

Zhao Chenyi, Zhong Donglai, Liu Lijun, Yang Yingjun, Shi Huiwen, Peng Lian-Mao, Zhang Zhiyong

机构信息

Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-Based Electronics, Department of Electronics, Peking University, Beijing 100871, China.

出版信息

ACS Nano. 2020 Nov 24;14(11):15267-15275. doi: 10.1021/acsnano.0c05554. Epub 2020 Oct 30.

Abstract

Silicon-based complementary metal-oxide-semiconductor (CMOS) has been the mainstream logic style for modern digital integrated circuits (ICs) for decades but will meet its performance limits soon. Extensive investigations have thus been carried out using other semiconductors, especially those with extremely high carrier mobility. However, these materials usually have small or even zero band gap, which leads inevitably to large leakage current or voltage loss in ICs based on these semiconductors. In this work, we propose and demonstrate a strengthened CMOS (SCMOS) logic style using modified field-effect transistors (FETs) to solve this problem, that is, to achieve high performance, utilizing the high carrier mobility in these materials, and to reduce the current leakage resulting from their small band gap. Conventional CMOS FETs are modified to have an asymmetric structure where an additional assistant gate is introduced near the drain to further lower the potential barrier in on-state and to increase the barrier in off-state. SCMOS ICs are constructed using these modified asymmetric CMOS FETs, which demonstrate perfect rail-to-rail output with negligible voltage loss and 3 orders of magnitude suppression of the static power consumption and an operating speed similar to or even higher than that of CMOS ICs. Here, SCMOS is demonstrated using carbon nanotubes, but, in principle, this logic style can be used in ICs based on any small-band-gap semiconductors to provide simultaneously high performance and low power consumption.

摘要

几十年来,硅基互补金属氧化物半导体(CMOS)一直是现代数字集成电路(IC)的主流逻辑风格,但很快将达到其性能极限。因此,人们已经对其他半导体进行了广泛研究,尤其是那些具有极高载流子迁移率的半导体。然而,这些材料通常具有小的甚至为零的带隙,这不可避免地导致基于这些半导体的集成电路中出现大的漏电流或电压损耗。在这项工作中,我们提出并演示了一种强化CMOS(SCMOS)逻辑风格,使用改进的场效应晶体管(FET)来解决这个问题,即利用这些材料中的高载流子迁移率实现高性能,并减少由于其小带隙导致的电流泄漏。传统的CMOS FET被修改为具有不对称结构,在漏极附近引入一个额外的辅助栅极,以进一步降低导通状态下的势垒并增加截止状态下的势垒。使用这些改进的不对称CMOS FET构建了SCMOS集成电路,其展示了完美的轨到轨输出,电压损耗可忽略不计,静态功耗抑制了3个数量级,并且工作速度与CMOS集成电路相似甚至更高。在这里,使用碳纳米管演示了SCMOS,但原则上,这种逻辑风格可用于基于任何小带隙半导体的集成电路中,以同时提供高性能和低功耗。

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