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通过改善横向电流扩展提高高效量子点发光二极管的空穴传输能力

Promoted Hole Transport Capability by Improving Lateral Current Spreading for High-Efficiency Quantum Dot Light-Emitting Diodes.

作者信息

Wu Qianqian, Cao Fan, Wang Haoran, Kou Jianquan, Zhang Zi-Hui, Yang Xuyong

机构信息

Key Laboratory of Advanced Display and System Applications of Ministry of Education Shanghai University 149 Yanchang Road Shanghai 200072 China.

State Key Laboratory of Reliability and Intelligence of Electrical Equipment Hebei University of Technology 5340 Xiping Road, Beichen District Tianjin 300401 China.

出版信息

Adv Sci (Weinh). 2020 Nov 1;7(23):2001760. doi: 10.1002/advs.202001760. eCollection 2020 Dec.

Abstract

Carrier imbalance resulting from stronger electron injection from ZnO into quantum-dot (QD) emissive layer than hole injection is one critical issue that constrains the performance of QDs-based light-emitting diodes (QLEDs). This study reports highly efficient inverted QLEDs enabled by periodic insertion of MoO into (4,4'-bis(-carbazolyl)-1,1'-biphenyl) (CBP) hole transport layer (HTL). The periodic ultrathin MoO/CBP-stacked HTL results in improved lateral current spreading for the QLEDs, which significantly relieves the crowding of holes and thus enhances hole transport capability across the CBP in QLEDs. Comprehensive analysis on the photoelectric properties of devices shows that the optimal thickness for MoO interlayer inserted in CBP is only ≈1 nm. The resulting devices with periodic two insertion layers of MoO into CBP exhibit better performance compared with the CBP-only ones, such that the peak current efficiency is 88.7 cd A corresponding to the external quantum efficiency of 20.6%. Furthermore, the resulting QLEDs show an operational lifetime almost 2.5 times longer compared to CBP-only devices.

摘要

由于从氧化锌向量子点(QD)发光层的电子注入比空穴注入更强而导致的载流子失衡是制约基于量子点的发光二极管(QLED)性能的一个关键问题。本研究报告了通过在(4,4'-双(咔唑基)-1,1'-联苯)(CBP)空穴传输层(HTL)中周期性插入MoO实现的高效倒置QLED。周期性的超薄MoO/CBP堆叠HTL改善了QLED的横向电流扩展,这显著缓解了空穴的拥挤,从而增强了QLED中跨CBP的空穴传输能力。对器件光电性能的综合分析表明,插入CBP中的MoO中间层的最佳厚度仅约为1nm。与仅使用CBP的器件相比,在CBP中具有周期性两个MoO插入层的所得器件表现出更好的性能,其峰值电流效率为88.7 cd/A,对应于20.6%的外量子效率。此外,所得的QLED的工作寿命比仅使用CBP的器件长近2.5倍。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1cf3/7709982/cadcc8a03c90/ADVS-7-2001760-g001.jpg

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