Vankayala Ranganayakulu K, Lan Tian-Wey, Parajuli Prakash, Liu Fengjiao, Rao Rahul, Yu Shih Hsun, Hung Tsu-Lien, Lee Chih-Hao, Yano Shin-Ichiro, Hsing Cheng-Rong, Nguyen Duc-Long, Chen Cheng-Lung, Bhattacharya Sriparna, Chen Kuei-Hsien, Ou Min-Nan, Rancu Oliver, Rao Apparao M, Chen Yang-Yuan
Institute of Physics Academia Sinica Taipei 11529 Taiwan, ROC.
Dept. of Engineering and System Science National Tsing Hua University Hsinchu 30013 Taiwan, ROC.
Adv Sci (Weinh). 2020 Nov 6;7(24):2002494. doi: 10.1002/advs.202002494. eCollection 2020 Dec.
A record high of 2.2 at 740 K is reported in GeSbTe single crystals, with an optimal hole carrier concentration ≈4 × 10 cm that simultaneously maximizes the power factor () ≈56 µW cmK and minimizes the thermal conductivity ≈1.9 Wm K. In addition to the presence of herringbone domains and stacking faults, the GeSbTe exhibits significant modification to phonon dispersion with an extra phonon excitation around ≈5-6 meV at point of the Brillouin zone as confirmed through inelastic neutron scattering (INS) measurements. Density functional theory (DFT) confirmed this phonon excitation, and predicted another higher energy phonon excitation ≈12-13 meV at point. These phonon excitations collectively increase the number of phonon decay channels leading to softening of phonon frequencies such that a three-phonon process is dominant in GeSbTe, in contrast to a dominant four-phonon process in pristine GeTe, highlighting the importance of phonon engineering approaches to improving thermoelectric () performance.
据报道,GeSbTe单晶在740 K时达到了创纪录的2.2的数值,最佳空穴载流子浓度约为4×10 cm,同时使功率因数()最大化,约为56 μW cmK,热导率最小化,约为1.9 Wm K。除了存在人字形畴和堆垛层错外,通过非弹性中子散射(INS)测量证实,GeSbTe在布里渊区的点处约5-6 meV处有额外的声子激发,对声子色散有显著改变。密度泛函理论(DFT)证实了这种声子激发,并预测在点处有另一个约12-13 meV的更高能量声子激发。这些声子激发共同增加了声子衰变通道的数量,导致声子频率软化,使得三声子过程在GeSbTe中占主导地位,这与原始GeTe中占主导地位的四声子过程形成对比,突出了声子工程方法对提高热电()性能的重要性。