Prete Domenic, Demontis Valeria, Zannier Valentina, Rodriguez-Douton Maria Jesus, Guazzelli Lorenzo, Beltram Fabio, Sorba Lucia, Rossella Francesco
NEST, Scuola Normale Superiore and Istituto Nanoscienze-CNR, Piazza S. Silvestro 12, I-56127, Pisa, Italy.
Università di Pisa, Dipartimento di Farmacia, via Bonanno 33, I-56126 Pisa, Italy.
Nanotechnology. 2021 Apr 2;32(14):145204. doi: 10.1088/1361-6528/abd659.
We fabricate dual-gated electric double layer (EDL) field effect transistors based on InAs nanowires gated with an ionic liquid, and we perform electrical transport measurements in the temperature range from room temperature to 4.2 K. By adjusting the spatial distribution of ions inside the ionic liquid employed as gate dielectric, we electrostatically induce doping in the nanostructures under analysis. We extract low-temperature carrier concentration and mobility in very different doping regimes from the analysis of current-voltage characteristics and transconductances measured exploiting global back-gating. In the liquid gate voltage interval from -2 to 2 V, carrier concentration can be enhanced up to two orders of magnitude. Meanwhile, the effect of the ionic accumulation on the nanowire surface turns out to be detrimental to the electron mobility of the semiconductor nanostructure: the electron mobility is quenched irrespectively to the sign of the accumulated ionic species. The reported results shine light on the effective impact on crucial transport parameters of EDL gating in semiconductor nanodevices and they should be considered when designing experiments in which electrostatic doping of semiconductor nanostructures via electrolyte gating is involved.
我们基于用离子液体门控的铟砷纳米线制造了双栅极电双层(EDL)场效应晶体管,并在从室温到4.2 K的温度范围内进行了电输运测量。通过调整用作栅极电介质的离子液体内部离子的空间分布,我们在被分析的纳米结构中静电诱导掺杂。我们通过对利用全局背栅测量的电流-电压特性和跨导进行分析,在非常不同的掺杂区域中提取低温载流子浓度和迁移率。在-2至2 V的液体栅极电压区间内,载流子浓度可提高多达两个数量级。同时,事实证明纳米线表面上离子积累的影响对半导体纳米结构的电子迁移率不利:无论积累的离子种类的符号如何,电子迁移率都会被淬灭。所报道的结果揭示了EDL门控对半导体纳米器件关键输运参数的有效影响,并且在设计涉及通过电解质门控对半导体纳米结构进行静电掺杂的实验时应予以考虑。