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高迁移率 InAs 纳米线无结晶体管中的载流子输运。

Carrier transport in high mobility InAs nanowire junctionless transistors.

机构信息

IBM Semiconductor Research and Development Center , Manyata Embassy Business Park, Nagawara, Bangalore 560 045, India.

出版信息

Nano Lett. 2015 Mar 11;15(3):1684-90. doi: 10.1021/nl5043165. Epub 2015 Feb 9.

Abstract

The ability to understand and model the performance limits of nanowire transistors is the key to the design of next generation devices. Here, we report studies on high-mobility junctionless gate-all-around nanowire field effect transistor with carrier mobility reaching 2000 cm(2)/V·s at room temperature. Temperature-dependent transport measurements reveal activated transport at low temperatures due to surface donors, while at room temperature the transport shows a diffusive behavior. From the conductivity data, the extracted value of sound velocity in InAs nanowires is found to be an order less than the bulk. This low sound velocity is attributed to the extended crystal defects that ubiquitously appear in these nanowires. Analyzing the temperature-dependent mobility data, we identify the key scattering mechanisms limiting the carrier transport in these nanowires. Finally, using these scattering models, we perform drift-diffusion based transport simulations of a nanowire field-effect transistor and compare the device performances with experimental measurements. Our device modeling provides insight into performance limits of InAs nanowire transistors and can be used as a predictive methodology for nanowire-based integrated circuits.

摘要

理解和建模纳米线晶体管的性能极限是设计下一代器件的关键。在这里,我们报告了在室温下载流子迁移率达到 2000 cm²/V·s 的高迁移率结型栅全环绕纳米线场效应晶体管的研究。温度相关的输运测量表明,由于表面施主,低温下的输运为激活输运,而在室温下,输运呈现扩散行为。从电导率数据中,提取出的 InAs 纳米线中的声速值比体材料低一个数量级。这种低声速归因于这些纳米线中普遍存在的扩展晶体缺陷。通过分析温度相关的迁移率数据,我们确定了限制这些纳米线中载流子输运的关键散射机制。最后,我们使用这些散射模型对纳米线场效应晶体管进行基于漂移扩散的输运模拟,并将器件性能与实验测量进行比较。我们的器件建模为 InAs 纳米线晶体管的性能极限提供了深入的了解,并可作为基于纳米线的集成电路的预测方法。

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