Viti Leonardo, Vitiello Miriam S, Ercolani Daniele, Sorba Lucia, Tredicucci Alessandro
NEST, Istituto Nanoscienze-Consiglio Nazionale delle Ricerche (CNR) and Scuola Normale Superiore, Piazza San Silvestro 12, Pisa, 56127, Italy.
Nanoscale Res Lett. 2012 Feb 28;7(1):159. doi: 10.1186/1556-276X-7-159.
We investigated the transport properties of lateral gate field effect transistors (FET) that have been realized by employing, as active elements, (111) B-oriented InAs nanowires grown by chemical beam epitaxy with different Se-doping concentrations. On the basis of electrical measurements, it was found that the carrier mobility increases from 103 to 104 cm2/(V × sec) by varying the ditertiarybutyl selenide (DtBSe) precursor line pressure from 0 to 0.4 Torr, leading to an increase of the carrier density in the transistor channel of more than two orders of magnitude. By keeping the DtBSe line pressure at 0.1 Torr, the carrier density in the nanowire channel measures ≈ 5 × 1017 cm-3 ensuring the best peak transconductances (> 100 mS/m) together with very low resistivity values (70 Ω × μm) and capacitances in the attofarad range. These results are particularly relevant for further optimization of the nanowire-FET terahertz detectors recently demonstrated.PACS: 73.63.-b, 81.07.Gf, 85.35.-p.
我们研究了横向栅极场效应晶体管(FET)的输运特性,这些晶体管是通过使用化学束外延生长的具有不同硒掺杂浓度的(111)B 取向砷化铟纳米线作为有源元件来实现的。基于电学测量发现,通过将二叔丁基硒(DtBSe)前驱体管路压力从 0 托变化到 0.4 托,载流子迁移率从 103 增加到 104 平方厘米/(伏·秒),导致晶体管沟道中的载流子密度增加超过两个数量级。通过将 DtBSe 管路压力保持在 0.1 托,纳米线沟道中的载流子密度约为 5×1017 立方厘米-3,确保了最佳的峰值跨导(>100 毫西门子/米)以及非常低的电阻率值(70 欧姆·微米)和阿托法拉范围内的电容。这些结果对于最近展示的纳米线-FET 太赫兹探测器的进一步优化尤为重要。物理和天文学分类号:73.63.-b,81.07.Gf,85.35.-p。