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探测MoS/hBN和hBN/MoS/hBN范德华异质结构中的带负电荷和中性激子。

Probing negatively charged and neutral excitons in MoS/hBN and hBN/MoS/hBN van der Waals heterostructures.

作者信息

Jadczak J, Kutrowska-Girzycka J, Bieniek M, Kazimierczuk T, Kossacki P, Schindler J J, Debus J, Watanabe K, Taniguchi T, Ho C H, Wójs A, Hawrylak P, Bryja L

机构信息

Department of Experimental Physics, Wrocław University of Science and Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland.

出版信息

Nanotechnology. 2021 Jan 19;32(14):145717. doi: 10.1088/1361-6528/abd507.

Abstract

High-quality van der Waals heterostructures assembled from hBN-encapsulated monolayer transition metal dichalcogenides enable observations of subtle optical and spin-valley properties whose identification was beyond the reach of structures exfoliated directly on standard SiO/Si substrates. Here, we describe different van der Waals heterostructures based on uncapped single-layer MoS stacked onto hBN layers of different thicknesses and hBN-encapsulated monolayers. Depending on the doping level, they reveal the fine structure of excitonic complexes, i.e. neutral and charged excitons. In the emission spectra of a particular MoS/hBN heterostructure without an hBN cap we resolve two trion peaks, T and T, energetically split by about 10 meV, resembling the pair of singlet and triplet trion peaks (T and T ) in tungsten-based materials. The existence of these trion features suggests that monolayer MoS has a dark excitonic ground state, despite having a 'bright' single-particle arrangement of spin-polarized conduction bands. In addition, we show that the effective excitonic g-factor significantly depends on the electron concentration and reaches the lowest value of -2.47 for hBN-encapsulated structures, which reveals a nearly neutral doping regime. In the uncapped MoS structures, the excitonic g-factor varies from -1.15 to -1.39 depending on the thickness of the bottom hBN layer and decreases as a function of rising temperature.

摘要

由hBN封装的单层过渡金属二卤化物组装而成的高质量范德华异质结构,能够观察到微妙的光学和自旋谷特性,而这些特性在直接剥离到标准SiO/Si衬底上的结构中是无法识别的。在这里,我们描述了基于堆叠在不同厚度hBN层上的未封装单层MoS以及hBN封装单层的不同范德华异质结构。根据掺杂水平,它们揭示了激子复合体的精细结构,即中性和带电激子。在特定的无hBN帽的MoS/hBN异质结构的发射光谱中,我们分辨出两个三重激子峰,T⁻和T⁺,能量上分裂约10 meV,类似于钨基材料中的单重态和三重态三重激子峰对(T₀和T₁)。这些三重激子特征的存在表明,尽管单层MoS具有自旋极化导带的“明亮”单粒子排列,但其仍具有暗激子基态。此外,我们表明,有效激子g因子显著取决于电子浓度,对于hBN封装的结构,其达到最低值-2.47,这揭示了一种近乎中性的掺杂状态。在无帽的MoS结构中,激子g因子根据底部hBN层的厚度在-1.15至-1.39之间变化,并随温度升高而降低。

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