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通过控制六方氮化硼封装的二硫化钼中的载流子浓度来揭示三重激子的精细结构。

Exposing the trion's fine structure by controlling the carrier concentration in hBN-encapsulated MoS.

作者信息

Grzeszczyk Magdalena, Olkowska-Pucko Katarzyna, Nogajewski Karol, Watanabe Kenji, Taniguchi Takashi, Kossacki Piotr, Babiński Adam, Molas Maciej R

机构信息

Institute of Experimental Physics, Faculty of Physics, University of Warsaw, 02-093 Warsaw, Poland.

Research Center for Functional Materials, National Institute for Materials Science, 305-0044, Japan.

出版信息

Nanoscale. 2021 Nov 18;13(44):18726-18733. doi: 10.1039/d1nr03855a.

Abstract

Atomically thin materials, like semiconducting transition metal dichalcogenides, are highly sensitive to the environment. This opens up an opportunity to externally control their properties by changing their surroundings. In this work, high-quality van der Waals heterostructures assembled from hBN-encapsulated monolayer MoS are studied with the aid of photoluminescence, photoluminescence excitation, and reflectance contrast experiments. We demonstrate that carrier concentration in MoS monolayers, arising from charge transfer from impurities in the substrate, can be significantly tuned within one order of magnitude by the modification of the bottom hBN flake thickness. The studied structures, characterized by spectral lines with linewidths approaching the narrow homogeneously broadened limit enabled observations of subtle optical and spin-valley properties of excitonic complexes. Our results allowed us to resolve three optically-active negatively charged excitons in MoS monolayers, which are assigned to the intravalley singlet, intervalley singlet, and intervalley triplet states.

摘要

原子级薄材料,如半导体过渡金属二硫属化物,对环境高度敏感。这为通过改变其周围环境来外部控制其性质提供了一个机会。在这项工作中,借助光致发光、光致发光激发和反射率对比实验,对由hBN封装的单层MoS组装而成的高质量范德华异质结构进行了研究。我们证明,通过改变底部hBN薄片的厚度,可以在一个数量级内显著调节由衬底中杂质的电荷转移引起的MoS单层中的载流子浓度。所研究的结构以谱线宽度接近窄均匀展宽极限为特征,使得能够观察到激子复合体微妙的光学和自旋谷特性。我们的结果使我们能够分辨出MoS单层中的三种光学活性带负电激子,它们分别被归因于谷内单重态、谷间单重态和谷间三重态。

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