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CdSe/ZnS量子点对甲脒铅卤化物钙钛矿的缺陷抑制及光响应增强

Defect suppression and photoresponsivity enhancement in methylammonium lead halide perovskites by CdSe/ZnS quantum dots.

作者信息

Vu Thi Kim Oanh, Cho Il-Wook, Oh Jaewon, Lee Dong Uk, Ryu Mee-Yi, Kim Eun Kyu

机构信息

Department of Physics and Research Institute for Natural Sciences, Hanyang University, Seoul 04763, Republic of Korea.

Department of Physics, Kangwon National University, Chuncheon, 24341, Republic of Korea.

出版信息

J Colloid Interface Sci. 2021 May 15;590:19-27. doi: 10.1016/j.jcis.2021.01.037. Epub 2021 Jan 20.

Abstract

Potential strategies such as surface passivation and perovskite material halide mixing may protect material surfaces, improve luminescence, and reduce charge traps for device stability. In this study, we used deep level transient spectroscopy to investigate the effect of CdSe/ZnS core-shell quantum dots (QDs) on defect states and carrier transport in methylammonium (MA) lead halide perovskites (CHNHPbX where X  = I, Br). In MAPbI and MAPbIBr films with CdSe/ZnS QDs, the density of hole traps located at E + 0.37 eV and E + 0.56 eV was reduced dramatically. Deep traps at E + 0.78 eV and E + 1.08 eV were removed, and one broad electron trap signal dominated. Film photoresponsivity under 600-nm wavelength light and a bias voltage of -0.7 V was 10 and 18 mA/W, which is 100 and 27 times larger than the 0.1 and 0.67 mA/W of bare perovskites (PS), respectively. This demonstrates that carrier transport was enhanced due to defect suppression. Our findings on defect suppression and photoresponsivity enhancement provide an important direction for optimizing high-performance PS device fabrication.

摘要

诸如表面钝化和钙钛矿材料卤化物混合等潜在策略可以保护材料表面、改善发光并减少电荷陷阱以提高器件稳定性。在本研究中,我们使用深能级瞬态光谱来研究CdSe/ZnS核壳量子点(QDs)对甲铵(MA)铅卤化物钙钛矿(CH₃NH₃PbX,其中X = I、Br)中缺陷态和载流子传输的影响。在含有CdSe/ZnS量子点的MAPbI₃和MAPbI₃Br₃薄膜中,位于E + 0.37 eV和E + 0.56 eV处的空穴陷阱密度大幅降低。位于E + 0.78 eV和E + 1.08 eV处的深陷阱被消除,并且一个宽的电子陷阱信号占主导。在600 nm波长光和-0.7 V偏压下,薄膜的光响应度分别为10和18 mA/W,分别是裸钙钛矿(PS)的0.1和0.67 mA/W的100倍和27倍。这表明由于缺陷抑制,载流子传输得到了增强。我们关于缺陷抑制和光响应度增强的研究结果为优化高性能PS器件制造提供了一个重要方向。

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